Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10126653 | Pattern forming method and resist composition | Kaoru Iwato, Shohei Kataoka, Sou Kamimura, Keita Kato, Yuichiro Enomoto +3 more | 2018-11-13 |
| 9897922 | Method of forming pattern and developer for use in the method | Yuichiro Enomoto, Sou Kamimura, Kaoru Iwato, Keita Kato, Kana Fujii | 2018-02-20 |
| 9709892 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same | Shohei Kataoka, Kaoru Iwato, Sou Kamimura, Toru Tsuchihashi, Yuichiro Enomoto +3 more | 2017-07-18 |
| 9663671 | Curable composition for imprints and method of storing the same | Yuichiro Enomoto, Kunihiko Kodama | 2017-05-30 |
| 9551935 | Pattern forming method and resist composition | Keita Kato, Toru Tsuchihashi, Sou Kamimura, Yuichiro Enomoto, Kana Fujii +3 more | 2017-01-24 |
| 9507263 | Underlay film composition for imprints and method of forming pattern and pattern formation method using the same | Kunihiko Kodama, Yuichiro Enomoto, Tadashi OOMATSU, Takayuki Ito, Hirotaka KITAGAWA +1 more | 2016-11-29 |
| 9482958 | Method of forming pattern and developer for use in the method | Yuichiro Enomoto, Sou Kamimura, Kaoru Iwato, Keita Kato, Kana Fujii | 2016-11-01 |
| 9223219 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | Yuichiro Enomoto, Sou Kamimura, Kaoru Iwato, Keita Kato, Akinori Shibuya | 2015-12-29 |
| 9116437 | Pattern forming method, chemical amplification resist composition and resist film | Yuichiro Enomoto, Sou Kamimura | 2015-08-25 |
| 9097973 | Method of forming pattern and developer for use in the method | Yuichiro Enomoto, Sou Kamimura, Kaoru Iwato, Keita Kato, Kana Fujii | 2015-08-04 |
| 8999621 | Pattern forming method, chemical amplification resist composition and resist film | Yuichiro Enomoto, Sou Kamimura, Keita Kato, Kaoru Iwato | 2015-04-07 |
| 8933144 | Curable composition for imprint, pattern-forming method and pattern | Yuichiro Enomoto, Kunihiko Kodama | 2015-01-13 |
| 8911930 | Method of forming pattern using actinic-ray or radiation-sensitive resin composition, and pattern | Yuichiro Enomoto, Akinori Shibuya, Shuhei Yamaguchi | 2014-12-16 |
| 8877828 | Method for producing curable composition for imprints | Yuichiro Enomoto, Kunihiko Kodama | 2014-11-04 |
| 8871642 | Method of forming pattern and developer for use in the method | Yuichiro Enomoto, Sou Kamimura, Keita Kato, Kana Fujii | 2014-10-28 |
| 8820541 | Method for producing curable composition for imprints | Yuichiro Enomoto, Kunihiko Kodama | 2014-09-02 |
| 8808965 | Pattern forming method, pattern, chemical amplification resist composition and resist film | Kaoru Iwato, Yuichiro Enomoto, Sou Kamimura, Keita Kato | 2014-08-19 |
| 8753802 | Pattern forming method, chemical amplification resist composition and resist film | Keita Kato, Sou Kamimura, Yuichiro Enomoto, Kaoru Iwato | 2014-06-17 |
| 8709704 | Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method | Sou Kamimura | 2014-04-29 |
| 8647812 | Pattern forming method, chemical amplification resist composition and resist film | Kana Fujii | 2014-02-11 |
| 8632938 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | Shinichi Sugiyama, Takayuki Kato, Kaoru Iwato, Hiroshi Saegusa | 2014-01-21 |
| 8603733 | Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method | Hideaki Tsubaki, Kazuyoshi Mizutani, Kenji Wada, Wataru HOSHINO | 2013-12-10 |
| 8241840 | Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method | Hideaki Tsubaki, Kazuyoshi Mizuyoshi, Kenji Wada, Wataru HOSHINO | 2012-08-14 |
| 8088550 | Positive resist composition and pattern forming method | Hideaki Tsubaki, Kenji Wada | 2012-01-03 |
| 8034547 | Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method | Hideaki Tsubaki, Kazuyoshi Mizutani, Kenji Wada, Wataru HOSHINO | 2011-10-11 |