SK

Sou Kamimura

FU Fujifilm: 26 patents #266 of 4,519Top 6%
Overall (All Time): #150,716 of 4,157,543Top 4%
26
Patents All Time

Issued Patents All Time

Showing 25 most recent of 26 patents

Patent #TitleCo-InventorsDate
12346026 Composition for forming underlayer film, resist pattern forming method, and manufacturing method of electronic device Toshiaki Fukuhara, Takeshi Kawabata 2025-07-01
10248019 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film Shohei Kataoka, Kaoru Iwato, Kana Fujii, Yuichiro Enomoto, Keita Kato +1 more 2019-04-02
10126653 Pattern forming method and resist composition Kaoru Iwato, Shohei Kataoka, Shinji Tarutani, Keita Kato, Yuichiro Enomoto +3 more 2018-11-13
9897922 Method of forming pattern and developer for use in the method Yuichiro Enomoto, Shinji Tarutani, Kaoru Iwato, Keita Kato, Kana Fujii 2018-02-20
9760003 Pattern forming method and actinic-ray- or radiation-sensitive resin composition Kaoru Iwato, Hidenori Takahashi, Shuji Hirano, Keita Kato 2017-09-12
9709892 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same Shohei Kataoka, Kaoru Iwato, Toru Tsuchihashi, Yuichiro Enomoto, Kana Fujii +3 more 2017-07-18
9551935 Pattern forming method and resist composition Keita Kato, Shinji Tarutani, Toru Tsuchihashi, Yuichiro Enomoto, Kana Fujii +3 more 2017-01-24
9513547 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device Hidenori Takahashi, Keita Kato 2016-12-06
9482958 Method of forming pattern and developer for use in the method Yuichiro Enomoto, Shinji Tarutani, Kaoru Iwato, Keita Kato, Kana Fujii 2016-11-01
9223219 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film Yuichiro Enomoto, Shinji Tarutani, Kaoru Iwato, Keita Kato, Akinori Shibuya 2015-12-29
9128376 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device Keita Kato, Michihiro SHIRAKAWA, Hidenori Takahashi 2015-09-08
9116437 Pattern forming method, chemical amplification resist composition and resist film Yuichiro Enomoto, Shinji Tarutani 2015-08-25
9097973 Method of forming pattern and developer for use in the method Yuichiro Enomoto, Shinji Tarutani, Kaoru Iwato, Keita Kato, Kana Fujii 2015-08-04
8999621 Pattern forming method, chemical amplification resist composition and resist film Yuichiro Enomoto, Shinji Tarutani, Keita Kato, Kaoru Iwato 2015-04-07
8871642 Method of forming pattern and developer for use in the method Yuichiro Enomoto, Shinji Tarutani, Keita Kato, Kana Fujii 2014-10-28
8859192 Negative pattern forming method and resist pattern Keita Kato, Kana Fujii, Kaoru Iwato 2014-10-14
8808965 Pattern forming method, pattern, chemical amplification resist composition and resist film Kaoru Iwato, Shinji Tarutani, Yuichiro Enomoto, Keita Kato 2014-08-19
8753802 Pattern forming method, chemical amplification resist composition and resist film Keita Kato, Shinji Tarutani, Yuichiro Enomoto, Kaoru Iwato 2014-06-17
8709704 Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method Shinji Tarutani 2014-04-29
8663907 Method of forming pattern Keita Kato, Yuichiro Enomoto, Kaoru Iwato, Shohei Kataoka, Shoichi SAITOH 2014-03-04
8507174 Positive resist composition, pattern forming method using the composition, and compound for use in the composition Hidenori Takahashi, Kenji Wada 2013-08-13
8110333 Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound Yasutomo Kawanishi, Kenji Wada, Tomotaka Tsuchimura 2012-02-07
8092976 Resist composition and pattern forming method using the same Kenji Wada 2012-01-10
7718344 Resist composition and pattern forming method using the same Kenji Wada, Yasutomo Kawanishi 2010-05-18
7695892 Resist composition and pattern-forming method using same Yushi Kaneko 2010-04-13