Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10248019 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | Shohei Kataoka, Kaoru Iwato, Sou Kamimura, Yuichiro Enomoto, Keita Kato +1 more | 2019-04-02 |
| 10126653 | Pattern forming method and resist composition | Kaoru Iwato, Shohei Kataoka, Shinji Tarutani, Sou Kamimura, Keita Kato +3 more | 2018-11-13 |
| 9897922 | Method of forming pattern and developer for use in the method | Yuichiro Enomoto, Shinji Tarutani, Sou Kamimura, Kaoru Iwato, Keita Kato | 2018-02-20 |
| 9709892 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same | Shohei Kataoka, Kaoru Iwato, Sou Kamimura, Toru Tsuchihashi, Yuichiro Enomoto +3 more | 2017-07-18 |
| 9551935 | Pattern forming method and resist composition | Keita Kato, Shinji Tarutani, Toru Tsuchihashi, Sou Kamimura, Yuichiro Enomoto +3 more | 2017-01-24 |
| 9482958 | Method of forming pattern and developer for use in the method | Yuichiro Enomoto, Shinji Tarutani, Sou Kamimura, Kaoru Iwato, Keita Kato | 2016-11-01 |
| 9122151 | Resist composition, resist film therefrom and method of forming negative pattern using the composition | Hidenori Takahashi, Fumiyuki Nishiyama | 2015-09-01 |
| 9097973 | Method of forming pattern and developer for use in the method | Yuichiro Enomoto, Shinji Tarutani, Sou Kamimura, Kaoru Iwato, Keita Kato | 2015-08-04 |
| 8877423 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same | Toru Fujimori | 2014-11-04 |
| 8871642 | Method of forming pattern and developer for use in the method | Yuichiro Enomoto, Shinji Tarutani, Sou Kamimura, Keita Kato | 2014-10-28 |
| 8859192 | Negative pattern forming method and resist pattern | Keita Kato, Sou Kamimura, Kaoru Iwato | 2014-10-14 |
| 8795945 | Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same | Takamitsu Tomiga, Toru Fujimori | 2014-08-05 |
| 8741542 | Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same | Tomotaka Tsuchimura, Takayuki Ito, Toru Fujimori | 2014-06-03 |
| 8647812 | Pattern forming method, chemical amplification resist composition and resist film | Shinji Tarutani | 2014-02-11 |
| 8642245 | Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same | Tomotaka Tsuchimura, Toru Fujimori, Hidenori Takahashi, Takayuki Ito | 2014-02-04 |
| 8541161 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method | Shuji Hirano, Shinki Yamada, Toru Fujimori | 2013-09-24 |
| 8349535 | Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewith | Takamitsu Tomiga, Toru Tsuchihashi, Kazuyoshi Mizutani, Jiro Yokoyama, Shinichi Sugiyama +2 more | 2013-01-08 |