YK

Yasutomo Kawanishi

FU Fujifilm: 8 patents #1,085 of 4,519Top 25%
OM Omron: 6 patents #499 of 3,089Top 20%
Fujitsu Limited: 2 patents #10,930 of 24,456Top 45%
NU National University Corporation Nagoya University: 2 patents #92 of 782Top 15%
TO Toyota: 2 patents #10,861 of 26,838Top 45%
Overall (All Time): #253,382 of 4,157,543Top 7%
18
Patents All Time

Issued Patents All Time

Showing 1–18 of 18 patents

Patent #TitleCo-InventorsDate
10909717 Viewpoint recommendation apparatus, recommendation method thereof, and non-transitory computer readable medium Hiroshi Murase, Daisuke Deguchi, Nik Mohd Zarifie bin Hashim, Yusuke Nakano, Norimasa Kobori 2021-02-02
10909278 Simulation device, simulation method, control program and recording medium Yasumoto Mori, Mamoru Egi, Yasushi Ohno, Shota Miyaguchi 2021-02-02
10699106 Direction discrimination device and direction discrimination method Fumito Shimmura, Daisuke Deguchi, Ichiro Ide, Hiroshi Murase 2020-06-30
10241497 Adjustment apparatus, control parameter adjustment method, information processing program, and storage medium Yasumoto Mori, Mamoru Egi, Yasushi Ono, Shota Miyaguchi 2019-03-26
10038398 Motor control, apparatus, motor control method, control system, information processing program and recording medium Mamoru Egi, Yasushi Ohno, Yasumoto Mori 2018-07-31
10012977 Control device, control method, information processing program, and recording medium Yasushi Ono, Mamoru Egi, Yasumoto Mori 2018-07-03
9996062 Motor control apparatus, motor control method, program, and recording medium Yasushi Ono, Mamoru Egi, Yasumoto Mori 2018-06-12
9977418 Control device, control method, information processing program, and recording medium Yasushi Ono, Mamoru Egi, Yasumoto Mori 2018-05-22
8110333 Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound Sou Kamimura, Kenji Wada, Tomotaka Tsuchimura 2012-02-07
8084183 Resist composition for electron beam, X-ray, or EUV, and pattern-forming method using the same Katsuhiro Yamashita 2011-12-27
8021819 Sulfonium compound, photosensitive composition containing the compound and pattern-forming method using the photosensitive composition 2011-09-20
7851130 Photosensitive composition, compound for use in the photosensitive composition, and pattern-forming method using the photosensitive composition Kenji Wada 2010-12-14
7807329 Photosensitive composition and pattern-forming method using the same Kazuyoshi Mizutani 2010-10-05
7718344 Resist composition and pattern forming method using the same Sou Kamimura, Kenji Wada 2010-05-18
7615330 Positive resist composition and pattern formation method using the same Sou Kamimura, Tomoya Sasaki, Kenji Wada 2009-11-10
7541131 Resist composition, compound for use in the resist composition and pattern forming method using the resist composition 2009-06-02
7179586 Silver halide photographic light-sensitive material Takanori Hioki, Katsumi Kobayashi, Ryo Suzuki, Takeshi Suzumoto 2007-02-20
6818374 Silver halide photographic light-sensitive materials and method for development of the same Tokuju Oikawa, Tadashi Ito, Katsuyuki Watanabe, Mitsunori Hirano 2004-11-16