Issued Patents All Time
Showing 1–25 of 81 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11832508 | Organic electroluminescence device | Saki Takada, Eiji Fukuzaki | 2023-11-28 |
| 10444627 | Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device | Toru Fujimori, Wataru Nihashi, Shuji Hirano, Natsumi Yokokawa | 2019-10-15 |
| 10403832 | Organic electroluminescence device | Saki Takada, Eiji Fukuzaki | 2019-09-03 |
| 10234759 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern | Takeshi Kawabata, Akinori Shibuya, Akiyoshi GOTO, Masafumi KOJIMA, Keita Kato | 2019-03-19 |
| 10031419 | Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device | Shuji Hirano | 2018-07-24 |
| 10008671 | Organic thin-film transistor and method for manufacturing same | Teruki Niori, Yasunori Yonekuta, Hayato Yoshida | 2018-06-26 |
| 9915870 | Pattern forming method, composition kit and resist film, and method for producing electronic device using them, and electronic device | Kaoru Iwato | 2018-03-13 |
| 9905768 | Semiconductor device and insulating layer-forming composition | Yuzo Nagata, Satoru Yamada | 2018-02-27 |
| 9829796 | Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device | Takuya TSURUTA, Tomotaka Tsuchimura | 2017-11-28 |
| 9799832 | Organic thin-film transistor and method for manufacturing same | Teruki Niori, Yasunori Yonekuta, Syuji Hirano | 2017-10-24 |
| 9766547 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device | Shuji Hirano, Natsumi Yokokawa | 2017-09-19 |
| 9755160 | Thin film transistor | — | 2017-09-05 |
| 9651863 | Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | Shuji Hirano, Natsumi Yokokawa, Wataru Nihashi | 2017-05-16 |
| 9612535 | Pattern forming method, electron beam- or extreme ultraviolet-sensitive resin composition, resist film using the same, method of manufacturing electronic device, and electronic device | Shuji Hirano | 2017-04-04 |
| 9557643 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device | Tomotaka Tsuchimura, Takeshi Kawabata, Takuya TSURUTA | 2017-01-31 |
| 9551933 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device | Shuji Hirano, Natsumi Yokokawa, Wataru Nihashi | 2017-01-24 |
| 9527809 | Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device | Natsumi Yokokawa, Shuji Hirano, Wataru Nihashi, Hideaki Tsubaki | 2016-12-27 |
| 9500951 | Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device | Natsumi Yokokawa, Hideaki Tsubaki | 2016-11-22 |
| 9470980 | Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device | Naoki Inoue, Shuji Hirano, Hideaki Tsubaki | 2016-10-18 |
| 9448482 | Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device | Kaoru Iwato, Takanobu Takeda | 2016-09-20 |
| 9448477 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, manufacturing method of electronic device using the same, and electronic device | Takeshi Kawabata, Hideaki Tsubaki | 2016-09-20 |
| 9423690 | Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the same | Shuji Hirano, Natsumi Yokokawa, Wataru Nihashi | 2016-08-23 |
| 9411230 | Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device | Kaoru Iwato, Hideaki Tsubaki | 2016-08-09 |
| 9400430 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, mask blank and method of forming pattern | Tomotaka Tsuchimura | 2016-07-26 |
| 9323153 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same | Shuji Hirano, Hideaki Tsubaki | 2016-04-26 |