HT

Hiroo Takizawa

FU Fujifilm: 43 patents #98 of 4,519Top 3%
Fujitsu Limited: 32 patents #685 of 24,456Top 3%
UL Udc Ireland Limited: 4 patents #51 of 148Top 35%
FI Fujifilm Business Innovation: 2 patents #2,833 of 5,238Top 55%
Overall (All Time): #22,189 of 4,157,543Top 1%
81
Patents All Time

Issued Patents All Time

Showing 26–50 of 81 patents

Patent #TitleCo-InventorsDate
9323153 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same Shuji Hirano, Hideaki Tsubaki 2016-04-26
9291897 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device Shuji Hirano, Natsumi Yokokawa, Wataru Nihashi 2016-03-22
9291896 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic device Shuji Hirano, Natsumi Yokokawa, Wataru Nihashi 2016-03-22
9291898 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin Natsumi Yokokawa, Shuji Hirano, Wataru Nihashi 2016-03-22
9223215 Actinic ray-sensitive or radiation-sensitive composition, actinic ray-sensitive or radiation-sensitive film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin Natsumi Yokokawa, Takeshi Kawabata, Hideaki Tsubaki, Shuji Hirano 2015-12-29
9188862 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same Shuji Hirano, Hideaki Tsubaki 2015-11-17
9188865 Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device Natsumi Yokokawa, Hideaki Tsubaki 2015-11-17
9170489 Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device Hideaki Tsubaki, Shuji Hirano 2015-10-27
9152047 Actinic-ray- or radiation-sensitive resin composition, actinic-ray-or radiation-sensitive film therefrom, method of forming pattern, process for manufacturing semiconductor device, semiconductor device and compound Takeshi Kawabata, Hideaki Tsubaki 2015-10-06
9069246 Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method and resist film using the composition, and electronic device manufacturing method and electronic device using these Tomotaka Tsuchimura 2015-06-30
8945725 Organic electroluminescence device Saki Takada, Eiji Fukuzaki 2015-02-03
8614033 Resist film, resist coated mask blanks and method of forming resist pattern using the resist film, and chemical amplification type resist composition Tomotaka Tsuchimura, Takeshi Inasaki 2013-12-24
8420234 Organic electroluminescent device Ikuo Kinoshita, Akira Takeda, Toshihiro Ise, Masaaki Inoue, Takashi Kato 2013-04-16
8216698 Organic electroluminescence device, novel platinum complex compound and novel compound capable of being a ligand thereof Takeshi Murakami, Toshihiro Ise, Ikuo Kinoshita, Saki Takada, Akira Takeda 2012-07-10
8187729 Organic electroluminescence device Takeshi Murakami, Ikuo Kinoshita, Kazunari Yagi, Saki Takada, Akira Takeda +1 more 2012-05-29
7771915 Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method Masaharu Akiba, Takeharu Tani, Yoshio Inagaki 2010-08-10
7588863 Hologram recording method and hologram recording material Noriko Inoue 2009-09-15
7582390 Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method 2009-09-01
7582391 Two-photon absorption decolorizable material, two-photon absorption refractive index modulation material, two-photon absorption polymerization material, two-photon absorption polymerization method and three-dimensional optical recording material 2009-09-01
7572555 Hologram recording material, hologram recording method and optical recording medium Noriko Inoue 2009-08-11
7531667 Two-photon absorption dye-containing material, three-dimensional refractive index modulation material, three-dimensional absorption index modulation material and three-dimensional optical recording material 2009-05-12
7524589 Holographic recording medium and recording method Makoto Furuki, Katsunori Kawano 2009-04-28
7432036 Non-resonant two-photon absorbing material, non-resonant two-photon emitting material, and method for inducing absorption or generating emission of non-resonant two photons by using the material Takeharu Tani, Naoki Morinaga 2008-10-07
7236277 Holographic recording medium and holographic recording method using the same Katsunori Kawano, Makoto Furuki, Jiro Minabe, Shin Yasuda, Kazuhiro Hayashi +2 more 2007-06-26
7172856 Silver halide photographic light-sensitive material Takanori Hioki, Katsuhiro Yamashita 2007-02-06