Issued Patents All Time
Showing 51–71 of 71 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6589705 | Positive-working photoresist composition | Kenichiro Sato, Shoichiro Yasunami | 2003-07-08 |
| 6555289 | Positive photoresist composition | Tomoya Sasaki, Shoichiro Yasunami | 2003-04-29 |
| 6506535 | Positive working photoresist composition | Kenichiro Sato, Kunihiko Kodama | 2003-01-14 |
| 6479213 | Positive photoresist composition | Shoichiro Yasunami | 2002-11-12 |
| 6399269 | Bottom anti-reflective coating material composition for photoresist and method of forming resist pattern using the same | Makoto Momota | 2002-06-04 |
| 6387590 | Positive photoresist composition | Shoichiro Yasunami | 2002-05-14 |
| 6346363 | Positive photoresist composition | Shoichiro Yasunami | 2002-02-12 |
| 6296985 | Positive photoresist composition comprising a polysiloxane | Shoichiro Yasunami | 2001-10-02 |
| 6248500 | Composition for anti-reflective coating material | Hiroshi Yoshimoto | 2001-06-19 |
| 6165684 | Bottom anti-reflective coating material composition and method for forming resist pattern using the same | Makoto Momota | 2000-12-26 |
| 6132935 | Negative-working image recording material | Fumikazu Kobayashi, Keitaro Aoshima | 2000-10-17 |
| 6090531 | Compostion for anti-reflective coating material | Hiroshi Yoshimoto | 2000-07-18 |
| 5488182 | Phenol compounds containing methoxymethyl group or hydroxymethyl group | Fumikazu Kobayashi, Kazuo Maemoto | 1996-01-30 |
| 5460917 | Positive working photosensitive lithographic printing plate utilizing phenol derivative compound containing photosensitive composition | Fumikazu Kobayashi, Akira Nagashima | 1995-10-24 |
| 5338640 | Siloxane polymers and positive working light-sensitive compositions comprising the same | Toshiaki Aoai | 1994-08-16 |
| 5278273 | Siloxane polymers and positive working light-sensitive compositions comprising the same | Toshiaki Aoai | 1994-01-11 |
| 5276124 | Siloxane polymers and positive working light-sensitive compositions comprising the same | Toshiaki Aoai | 1994-01-04 |
| 5252686 | Siloxane polymers and positive working light-sensitive compositions comprising the same | Toshiaki Aoai | 1993-10-12 |
| 5216105 | Silicone polymers and positive working light-sensitive compositions comprising the same | Toshiaki Aoai | 1993-06-01 |
| 5143816 | Light-sensitive composition comprising a polysiloxane and a naphthoquinone | Toshiaki Aoai | 1992-09-01 |
| 5141840 | Light-sensitive composition containing onium salt and polysiloxane reaction product | Toshiaki Aoai | 1992-08-25 |