Issued Patents All Time
Showing 26–50 of 71 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7232640 | Positive resist composition | Shoichiro Yasunami | 2007-06-19 |
| 7217493 | Positive resist composition | Shoichiro Yasunami | 2007-05-15 |
| 7214467 | Photosensitive resin composition | Shinichi Kanna, Tomoya Sasaki | 2007-05-08 |
| 7202015 | Positive photoresist composition and pattern making method using the same | Shinichi Kanna, Tomoya Sasaki | 2007-04-10 |
| 7198880 | Positive resist composition | Tomoya Sasaki, Shinichi Kanna | 2007-04-03 |
| 7195856 | Positive resist composition and pattern formation method using the same | Tomoya Sasaki, Shinichi Kanna | 2007-03-27 |
| 7163776 | Positive-working resist composition | Tomoya Sasaki, Shinichi Kanna | 2007-01-16 |
| 7160666 | Photosensitive resin composition | Shinichi Kanna | 2007-01-09 |
| 7157208 | Positive resist composition and pattern forming method using the same | Tomoya Sasaki | 2007-01-02 |
| 7147987 | Positive resist composition and pattern formation method using the same | — | 2006-12-12 |
| 7138217 | Positive resist composition | Toshiaki Aoai, Shinichi Kanna | 2006-11-21 |
| 7108951 | Photosensitive resin composition | Tomoya Sasaki, Shinichi Kanna | 2006-09-19 |
| 7105273 | Positive resist composition | Shoichiro Yasunami, Hyou Takahashi | 2006-09-12 |
| 7083892 | Resist composition | Hyou Takahashi, Shoichiro Yasunami | 2006-08-01 |
| 6939662 | Positive-working resist composition | Shinichi Kanna, Tomoya Sasaki | 2005-09-06 |
| 6902862 | Resist composition | Hyou Takahashi, Shoichiro Yasunami | 2005-06-07 |
| 6878502 | Positive resist composition | Shinichi Kanna | 2005-04-12 |
| 6852467 | Positive resist composition | Toshiaki Aoai, Shoichiro Yasunami, Shinichi Kanna | 2005-02-08 |
| 6830871 | Chemical amplification type resist composition | Shinichi Kanna, Tomoya Sasaki | 2004-12-14 |
| 6830872 | Planographic printing plate precursor provided with an image forming layer containing a fluorine macromolecular compound | Shiro Tan | 2004-12-14 |
| 6811947 | Positive resist composition | Tomoya Sasaki, Shinichi Kanna | 2004-11-02 |
| 6808869 | Bottom anti-reflective coating material composition and method for forming resist pattern using the same | Makoto Momota | 2004-10-26 |
| 6777161 | Lower layer resist composition for silicon-containing two-layer resist | Shoichiro Yasunami | 2004-08-17 |
| 6743565 | Positive resist composition with (bis-tri fluoromethyl) methyl substituted styrene | Toru Fujimori, Shinichi Kanna | 2004-06-01 |
| 6727040 | Positive resist composition to be irradiated with one of an electron beam and X-ray | Tomoya Sasaki, Koji Shirakawa | 2004-04-27 |