Issued Patents All Time
Showing 1–25 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9075306 | Chemically amplified negative resist composition and patterning process | Takanobu Takeda, Tamotsu Watanabe, Ryuji Koitabashi, Keiichi Masunaga, Osamu Watanabe | 2015-07-07 |
| 8828645 | Negative resist composition and patterning process | Keiichi Masunaga, Daisuke Domon, Satoshi Watanabe | 2014-09-09 |
| 8603724 | Negative resist composition and patterning process | Keiichi Masunaga, Daisuke Domon, Satoshi Watanabe | 2013-12-10 |
| 8597868 | Negative resist composition and patterning process | Daisuke Domon, Keiichi Masunaga, Satoshi Watanabe | 2013-12-03 |
| 8592133 | Resist composition and patterning process | Satoshi Watanabe, Takeru Watanabe, Takeshi Kinsho | 2013-11-26 |
| 8586282 | Resist composition and patterning process | Satoshi Watanabe, Takeru Watanabe, Takeshi Kinsho | 2013-11-19 |
| 8557509 | Negative resist composition, patterning process, and testing process and preparation process of negative resist composition | Keiichi Masunaga, Daisuke Domon, Satoshi Watanabe | 2013-10-15 |
| 8546060 | Chemically amplified positive resist composition and pattern forming process | Keiichi Masunaga, Satoshi Watanabe, Daisuke Domon | 2013-10-01 |
| 8470511 | Chemically amplified negative resist composition for EB or EUV lithography and patterning process | Keiichi Masunaga, Satoshi Watanabe, Daisuke Domon | 2013-06-25 |
| 8470512 | Polymer, chemically amplified negative resist composition, and patterning process | Keiichi Masunaga, Satoshi Watanabe | 2013-06-25 |
| 8470509 | Negative resist composition and patterning process | Keiichi Masunaga, Daisuke Domon, Satoshi Watanabe | 2013-06-25 |
| 8426108 | Chemically amplified positive resist composition for EB or EUV lithography and patterning process | Keiichi Masunaga, Satoshi Watanabe, Daisuke Domon | 2013-04-23 |
| 8394577 | Patterning process | Tamotsu Watanabe, Satoshi Watanabe | 2013-03-12 |
| 8389201 | Positive resist composition and pattern forming process | Keiichi Masunaga, Daisuke Domon, Satoshi Watanabe | 2013-03-05 |
| 8361693 | Chemically amplified positive photoresist composition and pattern forming process | Keiichi Masunaga, Daisuke Domon, Satoshi Watanabe, Youichi Ohsawa, Masaki Ohashi | 2013-01-29 |
| 8361692 | Negative resist composition and patterning process using the same | Keiichi Masunaga, Daisuke Domon, Satoshi Watanabe | 2013-01-29 |
| 8288076 | Chemically amplified resist composition and pattern forming process | Keiichi Masunaga, Satoshi Watanabe, Daisuke Domon | 2012-10-16 |
| 8252518 | Chemically amplified positive resist composition and resist patterning process | Takanobu Takeda, Satoshi Watanabe | 2012-08-28 |
| 8168367 | Resist composition and patterning process | Satoshi Watanabe, Takeru Watanabe, Takeshi Kinsho | 2012-05-01 |
| 8110335 | Resist patterning process and manufacturing photo mask | Takanobu Takeda, Satoshi Watanabe, Tamotsu Watanabe, Keiichi Masunaga, Ryuji Koitabashi | 2012-02-07 |
| 6841334 | Onium salts and positive resist materials using the same | Fujio Yagihashi, Tomoyoshi Furihata, Jun Watanabe, Yoshio Kawai, Tadahito Matsuda | 2005-01-11 |
| 6667415 | Tertiary butyl 4,4-bis(4′-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same | Fujio Yagihashi, Jun Watanabe, Minoru Takamizawa, Yoshio Kawai, Tadahito Matsuda | 2003-12-23 |
| 5880169 | Sulfonium salts and chemically amplified positive resist compositions | Yoichi Osawa, Satoshi Watanabe, Katsuya Takemura, Shigehiro Nagura, Yoshio Kawai | 1999-03-09 |
| 5856561 | Bisphenol carboxylic acid tertiary ester derivatives and chemically amplified positive resist compositions | Takesi Nagata, Satoshi Watanabe, Katsuya Takemura, Tsunehiro Nishi, Shigehiro Nagura +1 more | 1999-01-05 |
| 5824824 | Sulfonium salts and chemically amplified positive resist compositions | Yoichi Osawa, Satoshi Watanabe, Kaysuya Takemura, Shigehiro Nagura, Yoshio Kawai | 1998-10-20 |