Issued Patents All Time
Showing 26–40 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5679496 | Chemically amplified positive resist composition | Youichi Ohsawa, Satoshi Watanabe, Katsuyuki Oikawa, Yoshio Kawai, Jiro Nakamura | 1997-10-21 |
| 5629134 | Chemically amplified positive resist composition | Katsuyuki Oikawa, Toshinobu Ishihara, Fujio Yagihashi, Yoshio Kawai, Jiro Nakamura | 1997-05-13 |
| 5624787 | Chemically amplified positive resist composition | Satoshi Watanabe, Katsuyuki Oikawa, Toshinobu Ishihara, Tadahito Matsuda, Yoshio Kawai | 1997-04-29 |
| 5612170 | Positive resist composition | Katsuya Takemura, Junji Tsuchiya, Toshinobu Ishihara, Yoshio Kawai, Jiro Nakamura | 1997-03-18 |
| 5512417 | Positive resist composition comprising a bis (t-butoxycarbonylmethly(thymolphthalein as a dissolution inhibitor | Hiroshi Ban, Fujio Yagihasi, Jun Watanabe, Minoru Takamizawa | 1996-04-30 |
| 5457003 | Negative working resist material, method for the production of the same and process of forming resist patterns using the same | Hiroshi Ban, Jiro Nakamura, Takao Kimura, Yoshio Kawai | 1995-10-10 |
| 5389492 | Resist composition comprising a siloxane or silsesquioxane polymer having silanol groups in a composition with a naphthoquinone compound | Tadayoshi Kokubo, Atsushi Sakamoto, Hiroshi Ban | 1995-02-14 |
| 5356753 | Positive resist material | Motoyuki Yamada, Osamu Watanabe, Hiroshi Ban, Yoshio Kawai | 1994-10-18 |
| 5290899 | Photosensitive material having a silicon-containing polymer | Masazumi Hasegawa | 1994-03-01 |
| 5158854 | Photosensitive and high energy beam sensitive resin composition containing substituted polysiloxane | Saburo Imamura, Katsuhide Onose | 1992-10-27 |
| 5057396 | Photosensitive material having a silicon-containing polymer | Masazumi Hasegawa | 1991-10-15 |
| 4702990 | Photosensitive resin composition and process for forming photo-resist pattern using the same | Masao Morita, Saburo Imamura, Toshiaki Tamamura, Osamu Kogure | 1987-10-27 |
| 4564579 | Pattern forming material of a siloxane polymer | Masao Morita, Saburo Imamura, Toshiaki Tamamura, Osamu Kogure | 1986-01-14 |
| 4507384 | Pattern forming material and method for forming pattern therewith | Masao Morita, Saburo Imamura, Toshiaki Tamamura, Osamu Kogure | 1985-03-26 |
| 4238385 | Coating composition for forming insulating film on electroconductive substrate for printed circuits and method therefor | Yasuomi Okado, Ken Nishizaki | 1980-12-09 |