Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4702990 | Photosensitive resin composition and process for forming photo-resist pattern using the same | Akinobu Tanaka, Masao Morita, Saburo Imamura, Toshiaki Tamamura | 1987-10-27 |
| 4690887 | Method for forming micro-patterns by development | Mitsutoshi Fukuda, Makoto Fukutomi, Kazunori Miyoshi | 1987-09-01 |
| 4686168 | Fluoroalkyl acrylate resist material and process for forming fine resist pattern | Tsuneo Fujii, Hiroshi Inukai, Takayuki Deguchi, Toshihiko Amano, Masami Kakuchi +1 more | 1987-08-11 |
| 4564579 | Pattern forming material of a siloxane polymer | Masao Morita, Akinobu Tanaka, Saburo Imamura, Toshiaki Tamamura | 1986-01-14 |
| 4539250 | Resist material and process for forming fine resist pattern | Tsuneo Fujii, Hiroshi Inukai, Takayuki Deguchi, Toshihiko Amano, Masami Kakuchi +1 more | 1985-09-03 |
| 4507384 | Pattern forming material and method for forming pattern therewith | Masao Morita, Akinobu Tanaka, Saburo Imamura, Toshiaki Tamamura | 1985-03-26 |
| 4426247 | Method for forming micropattern | Toshiaki Tamamura, Saburo Imamura, Masao Morita | 1984-01-17 |