Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11491507 | Sealant discharge nozzle and sealant discharge apparatus | Masayoshi Okamoto, Tadamichi Mawatari, Kensuke Tsuchiya, Masayoshi ZAITSU, Naohiro Otsuki +1 more | 2022-11-08 |
| 9656328 | Cutting tool | Manabu Saito, Tatsuo Nakahata, Hideharu Takahashi, Masao Watanabe, Eiji Hashimoto +1 more | 2017-05-23 |
| 8734067 | Drill | Manabu Saito, Tatsuo Nakahata, Hideharu Takahashi, Eiji Hashimoto, Hirofumi Higashiwaki | 2014-05-27 |
| 7135270 | Resist polymer, resist composition and patterning process | Takeru Watanabe, Tsunehiro Nishi, Kenji Funatsu, Koji Hasegawa | 2006-11-14 |
| 6916591 | Photoacid generators, chemically amplified resist compositions, and patterning process | Youichi Ohsawa, Katsuhiro Kobayashi, Katsuya Takemura, Kazunori Maeda | 2005-07-12 |
| 6844509 | Switch device having self-cleaning function | Koji Dono | 2005-01-18 |
| 6821129 | Connection device for stabilizing a contact with external connectors | — | 2004-11-23 |
| 6730453 | High molecular weight silicone compounds, resist compositions, and patterning method | Mutsuo Nakashima, Ichiro Kaneko, Toshinobu Ishihara, Jun Hatakeyama, Shigehiro Nagura | 2004-05-04 |
| 6309796 | High molecular weight silicone compounds resist compositions, and patterning method | Mutsuo Nakashima, Ichiro Kaneko, Toshinobu Ishihara, Jun Hatakeyama, Shigehiro Nagura | 2001-10-30 |
| 6066433 | High molecular weight silicone compounds, chemically amplified positive resist compositions, and patterning method | Katsuya Takemura, Ichiro Kaneko, Toshinobu Ishihara | 2000-05-23 |
| 6022665 | Polymers and chemically amplified positive resist compositions | Osamu Watanabe, Yoshihumi Takeda, Toshinobu Ishihara | 2000-02-08 |
| 5972560 | High molecular weight silicone compound, chemically amplified positive resist composition and patterning method | Ichiro Kaneko, Mutsuo Nakashima, Toshinobu Ishihara, Jun Hatakeyama, Shigehiro Nagura | 1999-10-26 |
| 5882844 | Chemically amplified positive resist composition | Toshinobu Ishihara, Shigehiro Nagura, Katsuya Takemura, Tsuguo Yamaoka | 1999-03-16 |
| 5844057 | Polymers and chemically amplified positive resist compositions | Osamu Watanabe, Yoshihumi Takeda, Toshinobu Ishihara | 1998-12-01 |
| 5731126 | Chemically amplified positive resist compositions | Katsuya Takemura, Toshinobu Ishihara | 1998-03-24 |
| 5691396 | Polysiloxane compounds and positive resist compositions | Katsuya Takemura, Osamu Watanabe, Toshinobu Ishihara | 1997-11-25 |
| 5612170 | Positive resist composition | Katsuya Takemura, Toshinobu Ishihara, Akinobu Tanaka, Yoshio Kawai, Jiro Nakamura | 1997-03-18 |
| 5580936 | Method for preparing partially tert-butoxylated poly(p-hydroxystyrene) | Katsuya Takemura, Osamu Watanabe, Yoshihumi Takeda, Toshinobu Ishihara | 1996-12-03 |