MN

Mutsuo Nakashima

SC Shin-Etsu Chemical Co.: 70 patents #36 of 2,176Top 2%
MC Mastsushita Electric Industrial Co.: 1 patents #1 of 26Top 4%
Overall (All Time): #29,546 of 4,157,543Top 1%
70
Patents All Time

Issued Patents All Time

Showing 1–25 of 70 patents

Patent #TitleCo-InventorsDate
8198016 Patterning process Jun Hatakeyama, Tsutomu Ogihara, Kazuhiro Katayama 2012-06-12
8153836 Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing Yoshitaka Hamada, Katsuya Takemura, Kazumi Noda 2012-04-10
8129100 Double patterning process Katsuya Takemura, Jun Hatakeyama, Kazumi Noda, Masaki Ohashi, Toshinobu Ishihara 2012-03-06
8026038 Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method Tsutomu Ogihara, Takafumi Ueda, Toshiharu Yano 2011-09-27
7745094 Resist composition and patterning process using the same Yoshitaka Hamada, Katsuya Takemura, Kazumi Noda 2010-06-29
7651829 Positive resist material and pattern formation method using the same Yoshitaka Hamada, Fujio Yagihashi, Kazumi Noda, Katsuya Takemura 2010-01-26
7638256 Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process Takeshi Kinsho, Takeru Watanabe, Yoshitaka Hamada 2009-12-29
7550247 Resist composition and patterning process Yoshitaka Hamada, Katsuya Takemura, Kazumi Noda, Toshihiko Fujii 2009-06-23
7485408 Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process Takeshi Kinsho, Koji Hasegawa, Takeru Watanabe 2009-02-03
7265234 Silsesquioxane compound mixture, method of making, resist composition, and patterning process Yoshitaka Hamada 2007-09-04
6962767 Acetal compound, polymer, resist composition and patterning process Takeru Watanabe, Takeshi Kinsho, Koji Hasegawa, Tsunehiro Nishi, Seiichiro Tachibana +1 more 2005-11-08
6835525 Polymer, resist composition and patterning process Tsunehiro Nishi, Seiichiro Tachibana, Kenji Funatsu 2004-12-28
6784268 Ether, polymer, resist composition and patterning process Seiichiro Tachibana, Tsunehiro Nishi 2004-08-31
6780563 Polymer, resist composition and patterning process Koji Hasegawa, Takeshi Kinsho, Takeru Watanabe, Seiichiro Tachibana, Tsunehiro Nishi +1 more 2004-08-24
6743566 Cyclic acetal compound, polymer, resist composition and patterning process Seiichiro Tachibana, Takeru Watanabe, Takeshi Kinsho, Koji Hasegawa, Tsunehiro Nishi +1 more 2004-06-01
6730453 High molecular weight silicone compounds, resist compositions, and patterning method Ichiro Kaneko, Toshinobu Ishihara, Junji Tsuchiya, Jun Hatakeyama, Shigehiro Nagura 2004-05-04
6677101 Polymers, resist materials, and pattern formation method Tsunehiro Nishi, Koji Hasegawa 2004-01-13
6673515 Polymer, resist composition and patterning process Tsunehiro Nishi, Seiichiro Tachibana, Takeshi Kinsho, Koji Hasegawa, Takeru Watanabe +1 more 2004-01-06
6670498 Ester compounds, polymers, resist compositions and patterning process Tsunehiro Nishi, Koji Hasegawa, Takeru Watanabe, Takeshi Kinsho, Seiichiro Tachibana +1 more 2003-12-30
6670094 Polymer, resist composition and patterning process Tsunehiro Nishi, Tomohiro Kobayashi 2003-12-30
6660448 Polymer, resist composition and patterning process Seiichiro Tachibana, Tsunehiro Nishi, Takeshi Kinsho, Koji Hasegawa, Takeru Watanabe +1 more 2003-12-09
6624335 Ether, polymer, resist composition and patterning process Seiichiro Tachibana, Tsunehiro Nishi 2003-09-23
6605678 Polymer, resist composition and patterning process Tsunehiro Nishi, Tomohiro Kobayashi 2003-08-12
6596463 Ester compounds, polymers, resist compositions and patterning process Koji Hasegawa, Tsunehiro Nishi, Takeshi Kinsho, Takeru Watanabe, Seiichiro Tachibana +1 more 2003-07-22
6586157 Ester compounds, polymers, resist compositions and patterning process Koji Hasegawa, Tsunehiro Nishi, Takeshi Kinsho, Takeru Watanabe, Seiichiro Tachibana +1 more 2003-07-01