Issued Patents All Time
Showing 1–25 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9018095 | Formation of conductive circuit, conductive circuit, and conductive ink composition | — | 2015-04-28 |
| 8604126 | Silicone resin composition and optical material | Kazuhiro Hirahara | 2013-12-10 |
| 8546597 | Organic silane compound for forming Si-containing film by plasma CVD and method for forming Si-containing film | — | 2013-10-01 |
| 8537808 | SIP telephone set, and file transfer system, file transfer method and file transfer program thereof | — | 2013-09-17 |
| 8461367 | Preparation process of trisilylamine | Kazuhiro Hirahara | 2013-06-11 |
| 8434637 | Packaging bag | Kozo Mita, Atsuko Takahagi, Shin Yamada | 2013-05-07 |
| 8277600 | High-temperature bonding composition, substrate bonding method, and 3-D semiconductor device | Fujio Yagihashi, Takeshi Asano | 2012-10-02 |
| 8257528 | Substrate joining method and 3-D semiconductor device | Fujio Yagihashi, Takeshi Asano | 2012-09-04 |
| 8153836 | Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing | Mutsuo Nakashima, Katsuya Takemura, Kazumi Noda | 2012-04-10 |
| 7981815 | Semiconductor device producing method and substrate processing apparatus | Hironobu Miya, Kazuhiro Hirahara, Atsuhiko Suda | 2011-07-19 |
| 7923522 | Process for preparing a dispersion liquid of zeolite fine particles | Masaru Sasago, Hideo Nakagawa, Yasunori Morinaga | 2011-04-12 |
| 7786022 | Method for forming insulating film with low dielectric constant | Fujio Yagihashi, Takeshi Asano, Hideo Nakagawa, Masaru Sasago | 2010-08-31 |
| 7754330 | Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device | Fujio Yagihashi, Takeshi Asano, Hideo Nakagawa, Masaru Sasago | 2010-07-13 |
| 7745094 | Resist composition and patterning process using the same | Mutsuo Nakashima, Katsuya Takemura, Kazumi Noda | 2010-06-29 |
| 7651829 | Positive resist material and pattern formation method using the same | Fujio Yagihashi, Mutsuo Nakashima, Kazumi Noda, Katsuya Takemura | 2010-01-26 |
| 7638256 | Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process | Takeshi Kinsho, Takeru Watanabe, Mutsuo Nakashima | 2009-12-29 |
| 7550247 | Resist composition and patterning process | Mutsuo Nakashima, Katsuya Takemura, Kazumi Noda, Toshihiko Fujii | 2009-06-23 |
| 7541134 | Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same | Motoaki Iwabuchi, Tsutomu Ogihara, Takeshi Asano, Takafumi Ueda, Dirk Pfeiffer | 2009-06-02 |
| 7485690 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | Tsutomu Ogihara, Motoaki Iwabuchi, Takeshi Asano, Takafumi Ueda, Dirk Pfeiffer | 2009-02-03 |
| 7417104 | Porous film-forming composition, patterning process, and porous sacrificial film | Motoaki Iwabuchi, Tsutomu Ogihara, Takeshi Asano, Takafumi Ueda | 2008-08-26 |
| 7402621 | Porous-film-forming composition, preparation method of the composition, porous film and semiconductor device | Tsutomu Ogihara, Fujio Yagihashi, Takeshi Anaso, Motoaki Iwabuchi, Masaru Sasago +1 more | 2008-07-22 |
| 7385021 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | Tsutomu Ogihara, Motoaki Iwabuchi, Takeshi Asano, Takafumi Ueda | 2008-06-10 |
| 7357961 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | Motoaki Iwabuchi, Fujio Yagihashi, Takeshi Asano, Hideo Nakagawa, Masaru Sasago | 2008-04-15 |
| 7341775 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | Fujio Yagihashi, Hideo Nakagawa, Masaru Sasago | 2008-03-11 |
| 7332446 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device | Tsutomu Ogihara, Fujio Yagihashi, Takeshi Asano, Motoaki Iwabuchi, Hideo Nakagawa +1 more | 2008-02-19 |