Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12215221 | Material for forming organic film, method for forming organic film, patterning process, and compound | Daisuke KORI, Takayoshi NAKAHARA, Yusuke Biyajima | 2025-02-04 |
| 11018015 | Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process | Tsutomu Ogihara, Daisuke KORI, Seiichiro Tachibana, Yusuke Biyajima, Naoki Kobayashi | 2021-05-25 |
| 10007183 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | Seiichiro Tachibana, Daisuke KORI, Tsutomu Ogihara, Takeru Watanabe, Toshiharu Yano | 2018-06-26 |
| 9977330 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | Seiichiro Tachibana, Daisuke KORI, Tsutomu Ogihara, Takeru Watanabe, Toshiharu Yano | 2018-05-22 |
| 9728420 | Organic film composition, process for forming organic film, patterning process, and compound | Daisuke KORI, Kazunori Maeda, Rie Kikuchi, Tsutomu Ogihara | 2017-08-08 |
| 9372404 | Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer | Takeru Watanabe, Seiichiro Tachibana, Toshihiko Fujii, Toshiharu Yano, Takeshi Kinsho | 2016-06-21 |
| 9261788 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | Seiichiro Tachibana, Daisuke KORI, Tsutomu Ogihara, Takeru Watanabe, Toshiharu Yano | 2016-02-16 |
| 9069245 | Near-infrared absorptive layer-forming composition and multilayer film | Masaki Ohashi, Seiichiro Tachibana, Shozo Shirai, Takeshi Kinsho, Wu-Song Huang +3 more | 2015-06-30 |
| 9046764 | Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition | Seiichiro Tachibana, Daisuke KORI, Tsutomu Ogihara, Takeshi Kinsho | 2015-06-02 |
| 8722307 | Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer | Seiichiro Tachibana, Masaki Ohashi, Takeshi Kinsho, Wu-Song Huang, Dario L. Goldfarb +2 more | 2014-05-13 |
| 8323536 | Near-infrared absorbing dye, near-infrared absorptive film-forming composition, and near-infrared absorptive film | Masaki Ohashi, Takeshi Kinsho, Seiichiro Tachibana | 2012-12-04 |
| 8313890 | Antireflective coating composition, antireflective coating, and patterning process | Seiichiro Tachibana, Takeru Watanabe, Jun Hatakeyama, Takeshi Kinsho | 2012-11-20 |
| 8288072 | Resist lower layer film-formed substrate | Jun Hatakeyama, Seiichiro Tachibana, Takeshi Kinsho, Tsutomu Ogihara | 2012-10-16 |
| 8153836 | Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing | Mutsuo Nakashima, Yoshitaka Hamada, Katsuya Takemura | 2012-04-10 |
| 8129100 | Double patterning process | Katsuya Takemura, Jun Hatakeyama, Mutsuo Nakashima, Masaki Ohashi, Toshinobu Ishihara | 2012-03-06 |
| 7879530 | Antireflective coating composition, antireflective coating, and patterning process | Seiichiro Tachibana, Jun Hatakeyama, Takeshi Kinsho | 2011-02-01 |
| 7745094 | Resist composition and patterning process using the same | Mutsuo Nakashima, Yoshitaka Hamada, Katsuya Takemura | 2010-06-29 |
| 7687228 | Antireflection film composition and patterning process using the same | Jun Hatakeyama, Seiichiro Tachibana, Takeshi Kinsho, Tsutomu Ogihara | 2010-03-30 |
| 7651829 | Positive resist material and pattern formation method using the same | Yoshitaka Hamada, Fujio Yagihashi, Mutsuo Nakashima, Katsuya Takemura | 2010-01-26 |
| 7550247 | Resist composition and patterning process | Mutsuo Nakashima, Yoshitaka Hamada, Katsuya Takemura, Toshihiko Fujii | 2009-06-23 |
| 7510816 | Silicon-containing resist composition and patterning process | Katsuya Takemura, Youichi Ohsawa | 2009-03-31 |
| 7276324 | Nitrogen-containing organic compound, resist composition and patterning process | Takeru Watanabe, Takeshi Kinsho, Koji Hasegawa, Katsuya Takemura, Katsuhiro Kobayashi | 2007-10-02 |
| 7261995 | Nitrogen-containing organic compound, chemically amplified resist composition and patterning process | Takeru Watanabe, Koji Hasegawa, Katsuya Takemura | 2007-08-28 |
| 6899991 | Photo-curable resin composition, patterning process, and substrate protecting film | Hideto Kato, Toshihiko Fujii, Kazuhiro Arai, Satoshi Asai | 2005-05-31 |
| 6558867 | Lift-off resist compositions | Tomoyoshi Furihata, Hideto Kato | 2003-05-06 |