Issued Patents All Time
Showing 1–25 of 109 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9726977 | Coating compositions suitable for use with an overcoated photoresist | James F. Cameron, Jin Wuk Sung, John P. Amara, Greogory P. Prokopowicz, David A. Valeri +4 more | 2017-08-08 |
| 9465290 | Near-infrared absorbing film compositions | Martin Glodde, Dario L. Goldfarb, Wai-Kin Li, Sen Liu, Libor Vyklicky | 2016-10-11 |
| 9460934 | Wet strip process for an antireflective coating layer | Martin Glodde, Javier Perez, Takeshi Kinsho, Tsutomu Ogihara, Seiichiro Tachibana +1 more | 2016-10-04 |
| 9449822 | Method of forming semiconductor structures with contact holes | Wai-Kin Li, Joy Cheng, Kuang-Jung Chen | 2016-09-20 |
| 9348228 | Acid-strippable silicon-containing antireflective coating | Martin Glodde, Ratnam Sooriyakumaran | 2016-05-24 |
| 9337033 | Dielectric tone inversion materials | Martin Glodde, Hiroyuki Miyazoe, Ratnam Sooriyakumaran, HsinYu Tsai | 2016-05-10 |
| 9316916 | Method to mitigate resist pattern critical dimension variation in a double-exposure process | Kuang-Jung Chen, Wai-Kin Li | 2016-04-19 |
| 9281212 | Dielectric tone inversion materials | Martin Glodde, Hiroyuki Miyazoe, Ratnam Sooriyakumaran, HsinYu Tsai | 2016-03-08 |
| 9235119 | Exposure photolithography methods | Kuang-Jung Chen, Ranee W. Kwong, Sen Liu, Pushkara R. Varanasi | 2016-01-12 |
| 9069245 | Near-infrared absorptive layer-forming composition and multilayer film | Masaki Ohashi, Seiichiro Tachibana, Kazumi Noda, Shozo Shirai, Takeshi Kinsho +3 more | 2015-06-30 |
| 9040225 | Developable bottom antireflective coating composition and pattern forming method using thereof | Kuang-Jung Chen, Steven J. Holmes, Ranee W. Kwong, Sen Liu | 2015-05-26 |
| 8999624 | Developable bottom antireflective coating composition and pattern forming method using thereof | Kuang-Jung Chen, Steven J. Holmes, Ranee W. Kwong, Sen Liu | 2015-04-07 |
| 8999625 | Silicon-containing antireflective coatings including non-polymeric silsesquioxanes | Martin Glodde, Javier Perez, Ratnam Sooriyakumaran, Takeshi Kinsho, Tsutomu Ogihara +2 more | 2015-04-07 |
| 8986918 | Hybrid photoresist composition and pattern forming method using thereof | Gregory Breyta, Kuang-Jung Chen, Steven J. Holmes, Sen Liu | 2015-03-24 |
| 8932796 | Hybrid photoresist composition and pattern forming method using thereof | Kuang-Jung Chen, Sen Liu, Steven J. Holmes, Gregory Breyta | 2015-01-13 |
| 8846296 | Photoresist compositions | Kuang-Jung Chen, Ranee W. Kwong, Sen Liu, Pushkara R. Varanasi | 2014-09-30 |
| 8846295 | Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof | Kuang-Jung Chen, Wai-Kin Li | 2014-09-30 |
| 8802347 | Silicon containing coating compositions and methods of use | Robert David Allen, Phillip Brock, Kuang-Jung Chen, Alexander Friz, Ratnam Sooriyakumaran +2 more | 2014-08-12 |
| 8772376 | Near-infrared absorbing film compositions | Martin Glodde, Dario L. Goldfarb, Wai-Kin Li, Sen Liu, Libor Vyklicky | 2014-07-08 |
| 8759220 | Patterning process | Tsutomu Ogihara, Takafumi Ueda, Seiichiro Tachibana, Yoshinori Taneda, Martin Glodde +1 more | 2014-06-24 |
| 8722307 | Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer | Seiichiro Tachibana, Kazumi Noda, Masaki Ohashi, Takeshi Kinsho, Dario L. Goldfarb +2 more | 2014-05-13 |
| 8715907 | Developable bottom antireflective coating compositions for negative resists | Kuang-Jung Chen, Steven J. Holmes, Sen Liu | 2014-05-06 |
| 8609327 | Forming sub-lithographic patterns using double exposure | Kuang-Jung Chen, Wai-Kin Li | 2013-12-17 |
| 8586283 | Near-infrared absorbing film compositions | Martin Glodde, Dario L. Goldfarb, Wai-Kin Li, Sen Liu, Pushkara R. Varanasi +1 more | 2013-11-19 |
| 8568960 | Multiple exposure photolithography methods | Kuang-Jung Chen, Ranee W. Kwong, Sen Liu, Pushkara R. Varanasi | 2013-10-29 |