Issued Patents All Time
Showing 25 most recent of 58 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9851639 | Photoacid generating polymers containing a urethane linkage for lithography | Robert David Allen, Masaki Fujiwara, Kazuhiko Maeda, Hoa D. Truong | 2017-12-26 |
| 9057951 | Chemically amplified photoresist composition and process for its use | Robert David Allen, Richard Anthony DiPietro, Hoa D. Truong | 2015-06-16 |
| 9012587 | Photo-patternable dielectric materials and formulations and methods of use | Robert David Allen, Blake Davis, Qinghuang Lin, Robert D. Miller, Alshakim Nelson +1 more | 2015-04-21 |
| 9006373 | Photo-patternable dielectric materials curable to porous dielectric materials, formulations, precursors and methods of use thereof | Qinghuang Lin, Robert D. Miller, Alshakim Nelson, Jitendra S. Rathore, Ratnam Sooriyakumaran | 2015-04-14 |
| 8945808 | Self-topcoating resist for photolithography | Robert Allen David, Carl E. Larson, Daniel P. Sanders, Ratnam Sooriyakumaran, Linda Karin Sundberg +2 more | 2015-02-03 |
| 8946371 | Photo-patternable dielectric materials curable to porous dielectric materials, formulations, precursors and methods of use thereof | Blake Davis, Qinghuang Lin, Robert D. Miller, Alshakim Nelson, Jitendra S. Rathore +1 more | 2015-02-03 |
| 8802347 | Silicon containing coating compositions and methods of use | Robert David Allen, Kuang-Jung Chen, Alexander Friz, Wu-Song Huang, Ratnam Sooriyakumaran +2 more | 2014-08-12 |
| 8541477 | Methods of depolymerizing terephthalate polyesters | Abdullah M Alabdulrahman, Hamid A Almegren, Fares D. Alsewailem, Daniel J. Coady, Kazuki Fukushima +3 more | 2013-09-24 |
| 8470516 | Method of forming a relief pattern by e-beam lithography using chemical amplification, and derived articles | Robert David Allen, Luisa D. Bozano, Qinghuang Lin, Alshakim Nelson, Ratnam Sooriyakumaran | 2013-06-25 |
| 8440387 | Graded topcoat materials for immersion lithography | Robert David Allen, Daniel P. Sanders, Linda Karin Sundberg | 2013-05-14 |
| 8431670 | Photo-patternable dielectric materials and formulations and methods of use | Robert David Allen, Blake Davis, Qinghuang Lin, Robert D. Miller, Alshakim Nelson +1 more | 2013-04-30 |
| 8389663 | Photo-patternable dielectric materials curable to porous dielectric materials, formulations, precursors and methods of use thereof | Qinghuang Lin, Robert D. Miller, Alshakim Nelson, Jitendra S. Rathore, Ratnam Sooriyakumaran | 2013-03-05 |
| 8034532 | High contact angle topcoat material and use thereof in lithography process | Robert David Allen, Carl E. Larson, Ratnam Sooriyakumaran, Linda Karin Sundberg, Hoa D. Truong | 2011-10-11 |
| 8029971 | Photopatternable dielectric materials for BEOL applications and methods for use | Robert David Allen, Blake Davis, Qinghuang Lin, Robert D. Miller, Alshakim Nelson +1 more | 2011-10-04 |
| 7951524 | Self-topcoating photoresist for photolithography | Robert David Allen, Shiro Kusumoto, Yukio Nishimura, Daniel P. Sanders, Mark Steven Slezak +4 more | 2011-05-31 |
| 7944055 | Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures | Robert David Allen, Blake Davis, Wu-Song Huang, Qinghuang Lin, Alshakim Nelson +2 more | 2011-05-17 |
| 7919225 | Photopatternable dielectric materials for BEOL applications and methods for use | Robert David Allen, Blake Davis, Geraud Jean-Michel Dubois, Qinghuang Lin, Robert D. Miller +3 more | 2011-04-05 |
| 7867689 | Method of use for photopatternable dielectric materials for BEOL applications | Robert David Allen, Blake Davis, Qinghuang Lin, Robert D. Miller, Alshakim Nelson +1 more | 2011-01-11 |
| 7855045 | Immersion topcoat materials with improved performance | Robert David Allen, Dario Gil, William D. Hinsberg, Carl E. Larson, Linda Karin Sundberg +1 more | 2010-12-21 |
| 7820369 | Method for patterning a low activation energy photoresist | Robert David Allen, Gregory Breyta, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Hoa D. Truong +1 more | 2010-10-26 |
| 7759044 | Low activation energy dissolution modification agents for photoresist applications | Robert David Allen, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Hoa D. Truong | 2010-07-20 |
| 7709370 | Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures | Robert David Allen, Blake Davis, Wu-Song Huang, Qinghuang Lin, Alshakim Nelson +2 more | 2010-05-04 |
| 7678537 | Graded topcoat materials for immersion lithography | Robert David Allen, Daniel P. Sanders, Linda Karin Sundberg | 2010-03-16 |
| 7563558 | Negative resists based on acid-catalyzed elimination of polar molecules | Robert David Allen, Gregory Breyta, Richard Anthony DiPietro, David R. Medeiros, Ratnam Sooriyakumaran | 2009-07-21 |
| 7521172 | Topcoat material and use thereof in immersion lithography processes | Robert Allen David, Sean D. Burns, Dario L. Goldfarb, David R. Medeiros, Dirk Pfeiffer +3 more | 2009-04-21 |