Issued Patents All Time
Showing 1–25 of 47 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12110592 | Generating metal-oxide film | Wyatt Thornley, Krystelle Lionti, Daniel P. Sanders | 2024-10-08 |
| 12099043 | Protective enclosure for gas sensors | Thomas Pattison, Tom Van der Pol, Krystelle Lionti, Andrea Fasoli, Luisa D. Bozano | 2024-09-24 |
| 11624740 | Protective enclosure for gas sensors | Thomas Pattison, Tom Van der Pol, Krystelle Lionti, Andrea Fasoli, Luisa D. Bozano | 2023-04-11 |
| 11500285 | Multifunctional polymers | Luisa D. Bozano, Daisuke Domon, Yoshio Kawai, Keiichi Masunaga, Martha I. Sanchez +3 more | 2022-11-15 |
| 10915023 | Nitrogen heterocycle-containing monolayers on metal oxides for binding biopolymers | Shu-Jen Han, Brian Lin, Hareem T. Maune, Charles Thomas Rettner, Leslie E. Thompson +1 more | 2021-02-09 |
| 10345700 | Negative-tone resist compositions and multifunctional polymers therein | Luisa D. Bozano, Daisuke Domon, Yoshio Kawai, Keiichi Masunaga, Martha I. Sanchez +3 more | 2019-07-09 |
| 10236184 | Porous tin oxide films | Amy N. Bowers, Luisa D. Bozano, Andrea Fasoli, Krystelle Lionti, Elizabeth M. Lofano +1 more | 2019-03-19 |
| 10174229 | Adhesive resins for wafer bonding | Robert David Allen, Jeffrey D. Gelorme, Li-Wen Hung, Ratnam Sooriyakumaran | 2019-01-08 |
| 10020199 | Porous tin oxide films | Amy N. Bowers, Luisa D. Bozano, Andrea Fasoli, Krystelle Lionti, Elizabeth M. Lofano +1 more | 2018-07-10 |
| 9850406 | Adhesive resins for wafer bonding | Robert David Allen, Jeffrey D. Gelorme, Li-Wen Hung, Ratnam Sooriyakumaran | 2017-12-26 |
| 9389516 | Resist performance for the negative tone develop organic development process | Luisa D. Bozano, Dario L. Goldfarb, Hoa D. Truong, HsinYu Tsai, Gregory M. Walraff | 2016-07-12 |
| 9250529 | Photoresist compositions and methods of use in high index immersion lithography | Hiroshi Ito, Daniel P. Sanders | 2016-02-02 |
| 9181426 | Method of controlling orientation of domains in block copolymer films | Joy Cheng, Ho-Cheol Kim, Daniel P. Sanders | 2015-11-10 |
| 9057960 | Resist performance for the negative tone develop organic development process | Luisa D. Bozano, Dario L. Goldfarb, Hoa D. Truong, HsinYu Tsai, Gregory Michael Wallraff | 2015-06-16 |
| 8945808 | Self-topcoating resist for photolithography | Robert Allen David, Phillip Brock, Carl E. Larson, Daniel P. Sanders, Ratnam Sooriyakumaran +2 more | 2015-02-03 |
| 8900802 | Positive tone organic solvent developed chemically amplified resist | Robert David Allen, Ramakrishnan Ayothi, Luisa D. Bozano, William D. Hinsberg, Sally A. Swanson +2 more | 2014-12-02 |
| 8821978 | Methods of directed self-assembly and layered structures formed therefrom | Joy Cheng, William D. Hinsberg, Hiroshi Ito, Ho-Cheol Kim, Young-Hye Na +3 more | 2014-09-02 |
| 8802351 | Water-dispersible electrically conductive fluorine-containing polyaniline compositions for lithography | Luisa D. Bozano, Takayuki Nagasawa, Mark Hull Sherwood, Ratnam Sooriyakumaran, Satoshi Watanabe | 2014-08-12 |
| 8802357 | Method for using a topcoat composition | Hiroshi Ito | 2014-08-12 |
| 8703386 | Metal peroxo compounds with organic co-ligands for electron beam, deep UV and extreme UV photoresist applications | John David Bass, Ho-Cheol Kim, Robert D. Miller, Qing Song, Gregory Michael Wallraff | 2014-04-22 |
| 8530136 | Fluoroalcohol containing molecular photoresist materials and processes of use | Luisa D. Bozano, Gregory Breyta, Ekmini A. DeSilva, William D. Hinsberg, Ratnam Sooriyakumaran | 2013-09-10 |
| 8491965 | Method of controlling orientation of domains in block copolymer films | Joy Cheng, Ho-Cheol Kim, Daniel P. Sanders | 2013-07-23 |
| 8440387 | Graded topcoat materials for immersion lithography | Robert David Allen, Phillip Brock, Daniel P. Sanders | 2013-05-14 |
| 8426113 | Chemically amplified silsesquioxane resist compositions | Luisa D. Bozano, Blake Davis, Alshakim Nelson, Jitendra S. Rathore | 2013-04-23 |
| 8236482 | Photoresist compositions and methods of use in high index immersion lithography | Hiroshi Ito, Daniel P. Sanders | 2012-08-07 |