Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8828493 | Methods of directed self-assembly and layered structures formed therefrom | Joy Cheng, Charles Thomas Rettner, Daniel P. Sanders | 2014-09-09 |
| 8821978 | Methods of directed self-assembly and layered structures formed therefrom | Joy Cheng, Hiroshi Ito, Ho-Cheol Kim, Young-Hye Na, Daniel P. Sanders +3 more | 2014-09-02 |
| 8623458 | Methods of directed self-assembly, and layered structures formed therefrom | Joy Cheng, Matthew E. Colburn, Stefan Harrer, Steven J. Holmes, Ho-Cheol Kim +1 more | 2014-01-07 |
| 8530136 | Fluoroalcohol containing molecular photoresist materials and processes of use | Luisa D. Bozano, Gregory Breyta, Ekmini A. DeSilva, Ratnam Sooriyakumaran, Linda Karin Sundberg | 2013-09-10 |
| 8298751 | Alkaline rinse agents for use in lithographic patterning | Gregory Michael Wallraff | 2012-10-30 |
| 8247904 | Interconnection between sublithographic-pitched structures and lithographic-pitched structures | Sarunya Bangsaruntip, Daniel C. Edelstein, Ho-Cheol Kim, Steven J. Koester, Paul M. Soloman | 2012-08-21 |
| 8226838 | Method of forming polymer features by directed self-assembly of block copolymers | Joy Cheng, Ho-Cheol Kim, Charles Thomas Rettner, Daniel P. Sanders | 2012-07-24 |
| 7521094 | Method of forming polymer features by directed self-assembly of block copolymers | Joy Cheng, Ho-Cheol Kim, Charles Thomas Rettner, Daniel P. Sanders | 2009-04-21 |
| 7348127 | Topcoats for use in immersion lithography | — | 2008-03-25 |
| 7205093 | Topcoats for use in immersion lithography | — | 2007-04-17 |
| 7179571 | Apparatus for characterization of photoresist resolution, and method of use | John A. Hoffnagle, Frances Anne Houle, Martha I. Sanchez | 2007-02-20 |
| 7079223 | Fast model-based optical proximity correction | Alan E. Rosenbluth, Gregg M. Gallatin, Ronald Gordon, Nakgeuon Seong, Alexey Y. Lvov +3 more | 2006-07-18 |
| 7046342 | Apparatus for characterization of photoresist resolution, and method of use | John A. Hoffnagle, Frances Anne Houle, Martha I. Sanchez | 2006-05-16 |
| 6423465 | Process for preparing a patterned continuous polymeric brush on a substrate surface | Craig J. Hawker, James L. Hedrick, Marc Husemann, Michael Morrison | 2002-07-23 |
| 6277546 | Process for imaging of photoresist | Gregory Breyta, Nicholas J. Clecak, Donald C. Hofer, Hiroshi Ito, Scott A. MacDonald +1 more | 2001-08-21 |
| 5826065 | Software architecture for stochastic simulation of non-homogeneous systems | Frances Anne Houle | 1998-10-20 |
| 5745385 | Method for stochastic and deterministic timebase control in stochastic simulations | Frances Anne Houle | 1998-04-28 |
| 5658734 | Process for synthesizing chemical compounds | Phillip Brock, Jeffrey W. Labadie, Glenn McGall, Gregory Michael Wallraff | 1997-08-19 |
| 5625579 | Stochastic simulation method for processes containing equilibrium steps | Frances Anne Houle | 1997-04-29 |
| 5446870 | Spatially resolved stochastic simulation system | Frances Anne Houle | 1995-08-29 |
| 5432047 | Patterning process for bipolar optical storage medium | John C. Cheng, Robert T. Lynch, Scott A. MacDonald, Lester A. Pederson, James S. Wong | 1995-07-11 |
| 5372912 | Radiation-sensitive resist composition and process for its use | Robert David Allen, Jr. Conley, Pamela E. Jones, Kevin M. Welsh | 1994-12-13 |
| 5272042 | Positive photoresist system for near-UV to visible imaging | Robert David Allen, William R. Brunsvold, Burton J. Carpenter, Joseph LaTorre, Michael G. McMaster +5 more | 1993-12-21 |
| 5071730 | Liquid apply, aqueous processable photoresist compositions | Robert David Allen, Logan L. Simpson, Gregory Michael Wallraff | 1991-12-10 |
| 5068054 | Ferroelectric liquid crystals | Kathleen M. Betterton, Huu T. Nguyen, Wing Tsang Tang, Robert J. Twieg | 1991-11-26 |