| 6653048 |
High silicon content monomers and polymers suitable for 193 nm bilayer resists |
Phillip Brock, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Gregory Michael Wallraff |
2003-11-25 |
| RE38282 |
Process for using bilayer photoresist |
Robert David Allen, Ratnam Sooriyakumaran, Gregory Michael Wallraff |
2003-10-21 |
| 6482566 |
Hydroxycarborane photoresists and process for using same in bilayer thin film imaging lithography |
Scott A. MacDonald, Arpan Mahorowala, Robert D. Miller, Josef Michl, Gregory Michael Wallraff |
2002-11-19 |
| 6444408 |
High silicon content monomers and polymers suitable for 193 nm bilayer resists |
Phillip Brock, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Gregory Michael Wallraff |
2002-09-03 |
| 6277546 |
Process for imaging of photoresist |
Gregory Breyta, Nicholas J. Clecak, William D. Hinsberg, Hiroshi Ito, Scott A. MacDonald +1 more |
2001-08-21 |
| 6165673 |
Resist composition with radiation sensitive acid generator |
Gregory Breyta, Richard Anthony DiPietro, Hiroshi Ito, Robert David Allen, Juliann Opitz +1 more |
2000-12-26 |
| 5985524 |
Process for using bilayer photoresist |
Robert David Allen, Ratnam Sooriyakumaran, Gregory Michael Wallraff |
1999-11-16 |
| 5776990 |
Foamed polymer for use as dielectric material |
James L. Hedrick, Jeffrey W. Labadie, Robert Bruce Prime, Thomas P. Russell |
1998-07-07 |
| 5585220 |
Resist composition with radiation sensitive acid generator |
Gregory Breyta, Richard Anthony DiPietro, Hiroshi Ito |
1996-12-17 |
| RE34524 |
Polyimide coating compositions based on meta-dialkyldihydrogen pyromellitate and aromatic diamines |
Richard D. Diller, deceased, Anthony F. Arnold, Ying-Ying Cheng, Patricia Metzger Cotts, Mahmoud Khojasteh +3 more |
1994-01-25 |
| 5045608 |
Polyimide-poly(phenylquinoxaline) block copolymers |
James L. Hedrick, Jeffrey W. Labadie, Sally A. Swanson, Willi Volksen |
1991-09-03 |
| 4849501 |
Polyimide coating compositions based on meta-dialkyldihydrogen pyromellitate and aromatic diamines |
Richard D. Diller, deceased, Anthony F. Arnold, Ying-Ying Cheng, Patricia Metzger Cotts, Mahmoud Khojasteh +3 more |
1989-07-18 |
| 4612210 |
Process for planarizing a substrate |
Debra Brouse LaVergne, Robert J. Twieg, Willi Volksen |
1986-09-16 |
| 4464460 |
Process for making an imaged oxygen-reactive ion etch barrier |
Hiroyuki Hiraoka, Robert D. Miller, Lester A. Pederson, Carlton G. Willson |
1984-08-07 |
| 4291272 |
Method for reducing homonuclear broadening in magnetic resonance spectra of solids |
Raymond D. Kendrick, Costantino S. Yannoni |
1981-09-22 |
