MK

Mahmoud Khojasteh

IBM: 50 patents #1,732 of 70,183Top 3%
AC Advanced Technology & Materials Co.: 3 patents #122 of 410Top 30%
ZE Zeon: 2 patents #301 of 734Top 45%
📍 Poughkeepsie, NY: #71 of 1,613 inventorsTop 5%
🗺 New York: #1,862 of 115,490 inventorsTop 2%
Overall (All Time): #54,474 of 4,157,543Top 2%
50
Patents All Time

Issued Patents All Time

Showing 1–25 of 50 patents

Patent #TitleCo-InventorsDate
11444185 III-V lateral bipolar junction transistor on local facetted buried oxide layer Pouya Hashemi, Tak H. Ning, Alexander Reznicek 2022-09-13
11437502 III-V lateral bipolar junction transistor on local facetted buried oxide layer Pouya Hashemi, Tak H. Ning, Alexander Reznicek 2022-09-06
10748990 Stacked indium gallium arsenide nanosheets on silicon with bottom trapezoid isolation Takashi Ando, Pouya Hashemi, Alexander Reznicek 2020-08-18
10615271 III-V lateral bipolar junction transistor on local facetted buried oxide layer Pouya Hashemi, Tak H. Ning, Alexander Reznicek 2020-04-07
10546928 Forming stacked twin III-V nano-sheets using aspect-ratio trapping techniques Pouya Hashemi, Karthik Balakrishnan, Alexander Reznicek 2020-01-28
10388727 Stacked indium gallium arsenide nanosheets on silicon with bottom trapezoid isolation Takashi Ando, Pouya Hashemi, Alexander Reznicek 2019-08-20
10276384 Plasma shallow doping and wet removal of depth control cap Robert L. Bruce, Kevin K. Chan, Sebastian U. Engelmann, Dario L. Goldfarb, Marinus Hopstaken +3 more 2019-04-30
10167443 Wet clean process for removing CxHyFz etch residue Robert L. Bruce, Sebastian U. Engelmann, Eric A. Joseph, Masahiro Nakamura, Satyavolu S. Papa Rao +3 more 2019-01-01
9881793 Neutral hard mask and its application to graphoepitaxy-based directed self-assembly (DSA) patterning Sebastian U. Engelmann, Deborah A. Neumayer, John M. Papalia, HsinYu Tsai 2018-01-30
9536731 Wet clean process for removing CxHyFz etch residue Robert L. Bruce, Sebastian U. Engelmann, Eric A. Joseph, Masahiro Nakamura, Satyavolu S. Papa Rao +3 more 2017-01-03
9058976 Cleaning composition and process for cleaning semiconductor devices and/or tooling during manufacturing thereof Vishal Chhabra, Laertis Economikos, John A. Fitzsimmons, James Hannah, Jennifer V. Muncy 2015-06-16
8920567 Post metal chemical-mechanical planarization cleaning process Vamsi Devarapalli, Colin J. Goyette, Michael R. Kennett, Qinghuang Lin, James J. Steffes +2 more 2014-12-30
8647445 Process for cleaning semiconductor devices and/or tooling during manufacturing thereof Vishal Chhabra, John A. Fitzsimmons, Jennifer V. Muncy 2014-02-11
8618036 Aqueous cerium-containing solution having an extended bath lifetime for removing mask material Ali Afzali-Ardakani, John A. Fitzsimmons, Nicholas C. M. Fuller, Jennifer V. Muncy, George G. Totir +4 more 2013-12-31
8574680 Materials and methods for immobilization of catalysts on surfaces and for selective electroless metallization Tricia Breen Carmichael, Sarah J. Vella, Ali Afzali-Ardakani 2013-11-05
8563408 Spin-on formulation and method for stripping an ion implanted photoresist Ali Afzali-Ardakani, Ronald W. Nunes, George G. Totir 2013-10-22
8455366 Use of an organic planarizing mask for cutting a plurality of gate lines Nicholas C. M. Fuller, Pratik P. Joshi, Rajiv Ranade, George G. Totir 2013-06-04
8455420 Spin-on formulation and method for stripping an ion implanted photoresist Ali Afzali-Ardakani, Ronald W. Nunes, George G. Totir 2013-06-04
8445316 Non-lithographic method of patterning contacts for a photovoltaic device Ali Afzali-Ardakani, Jeffrey Hedrick, Young-Hee Kim 2013-05-21
8367555 Removal of masking material Ali Afzali-Ardakani, Emanuel I. Cooper, Ronald W. Nunes, George G. Totir 2013-02-05
8367556 Use of an organic planarizing mask for cutting a plurality of gate lines Nicholas C. M. Fuller, Pratik P. Joshi, Rajiv Ranade, George G. Totir 2013-02-05
8304178 Top antireflective coating composition containing hydrophobic and acidic groups Wu-Song Huang, Margaret C. Lawson, Kaushal S. Patel, Irene Popova, Pushkara R. Varanasi 2012-11-06
8252673 Spin-on formulation and method for stripping an ion implanted photoresist Ali Afzali-Ardakani, Ronald W. Nunes, George G. Totir 2012-08-28
8202678 Wet developable bottom antireflective coating composition and method for use thereof Kuang-Jung Chen, Ranee W. Kwong, Margaret C. Lawson, Wenjie Li, Kaushal S. Patel +1 more 2012-06-19
8026200 Low pH mixtures for the removal of high density implanted resist Emanuel I. Cooper, Julie Cissell, Renjie Zhou, Michael B. Korzenski, George G. Totir 2011-09-27