Issued Patents All Time
Showing 1–25 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10034387 | Method for recycling of obsolete printed circuit boards | Andre Brosseau, Svitlana Grigorenko, Ping Jiang | 2018-07-24 |
| 9972830 | Method for the recovery of lithium cobalt oxide from lithium ion batteries | Sarah L. Poe, Christopher Paradise, Laura Rose Muollo, Reshma Pal, John C. Warner | 2018-05-15 |
| 9731368 | Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipment | Tianniu Chen, Ping Jiang | 2017-08-15 |
| 9691629 | Compositions and methods for the selective removal of silicon nitride | Emanuel I. Cooper, Eileen Sparks, William R. Bowers, Mark A. Biscotto, Kevin P. Yanders | 2017-06-27 |
| 9649712 | Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipment | Tianniu Chen, Ping Jiang | 2017-05-16 |
| 9443713 | Oxidizing aqueous cleaner for the removal of post-etch residues | David W. Minsek, Martha M. Rajaratnam | 2016-09-13 |
| 9238850 | Sustainable process for reclaiming precious metals and base metals from e-waste | Ping Jiang, James Norman, John Warner, Laura Ingalls, Dinakar Gnanamgari +2 more | 2016-01-19 |
| 9221114 | Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipment | Tianniu Chen, Ping Jiang | 2015-12-29 |
| 9215813 | Method for recycling of obsolete printed circuit boards | Andre Brosseau, Svitlana Grigorenko, Ping Jiang | 2015-12-15 |
| 9158203 | Compositions and methods for the selective removal of silicon nitride | Emanuel I. Cooper, Eileen Sparks, William R. Bowers, Mark A. Biscotto, Kevin P. Yanders +2 more | 2015-10-13 |
| 9074169 | Lithographic tool in situ clean formulations | Tianniu Chen, Steven M. Bilodeau, Karl E. Boggs, Ping Jiang, George Mirth +1 more | 2015-07-07 |
| 8778210 | Compositions and methods for the selective removal of silicon nitride | Emanuel I. Cooper, Eileen Sparks, William R. Bowers, Mark A. Biscotto, Kevin P. Yanders +2 more | 2014-07-15 |
| 8765654 | Oxidizing aqueous cleaner for the removal of post-etch residues | David W. Minsek, Martha M. Rajaratnam | 2014-07-01 |
| 8642526 | Composition and method for recycling semiconductor wafers having low-k dielectric materials thereon | Pamela M. Visintin, Ping Jiang, Mackenzie King | 2014-02-04 |
| 8338087 | Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate | Melissa K. Rath, David Bernhard, David W. Minsek, Thomas H. Baum | 2012-12-25 |
| 8114220 | Formulations for cleaning ion-implanted photoresist layers from microelectronic devices | Pamela M. Visintin, Thomas H. Baum | 2012-02-14 |
| 8058219 | Metals compatible post-etch photoresist remover and/or sacrificial antireflective coating etchant | Melissa K. Rath, David Bernhard, Thomas H. Baum, Ping Jiang, Renjie Zhou | 2011-11-15 |
| 8026200 | Low pH mixtures for the removal of high density implanted resist | Emanuel I. Cooper, Julie Cissell, Renjie Zhou, George G. Totir, Mahmoud Khojasteh | 2011-09-27 |
| 7960328 | Composition and method for recycling semiconductor wafers having low-k dielectric materials thereon | Pamela M. Visintin, Ping Jiang, Mackenzie King | 2011-06-14 |
| 7922824 | Oxidizing aqueous cleaner for the removal of post-etch residues | David W. Minsek, Martha M. Rajaratnam | 2011-04-12 |
| 7557073 | Non-fluoride containing supercritical fluid composition for removal of ion-implant photoresist | Thomas H. Baum | 2009-07-07 |
| 7553803 | Enhancement of silicon-containing particulate material removal using supercritical fluid-based compositions | Thomas H. Baum | 2009-06-30 |
| 7517809 | Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations | Thomas H. Baum, Chongying Xu, Eliodor G. Ghenciu | 2009-04-14 |
| 7223352 | Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal | Eliodor G. Ghenciu, Chongying Xu, Thomas H. Baum | 2007-05-29 |
| 7160815 | Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations | Thomas H. Baum, Chongying Xu, Eliodor G. Ghenciu | 2007-01-09 |