MR

Martha M. Rajaratnam

SL Shipley Company, L.L.C.: 5 patents #57 of 401Top 15%
AC Advanced Technology & Materials Co.: 3 patents #122 of 410Top 30%
📍 Ridgefield, CT: #129 of 574 inventorsTop 25%
🗺 Connecticut: #5,660 of 34,797 inventorsTop 20%
Overall (All Time): #646,320 of 4,157,543Top 20%
8
Patents All Time

Issued Patents All Time

Showing 1–8 of 8 patents

Patent #TitleCo-InventorsDate
9443713 Oxidizing aqueous cleaner for the removal of post-etch residues David W. Minsek, Michael B. Korzenski 2016-09-13
8765654 Oxidizing aqueous cleaner for the removal of post-etch residues David W. Minsek, Michael B. Korzenski 2014-07-01
7922824 Oxidizing aqueous cleaner for the removal of post-etch residues David W. Minsek, Michael B. Korzenski 2011-04-12
6048672 Photoresist compositions and methods and articles of manufacture comprising same James F. Cameron, Roger F. Sinta, James W. Thackeray 2000-04-11
5731364 Photoimageable compositions comprising multiple arylsulfonium photoactive compounds Roger F. Sinta, James F. Cameron, Timothy G. Adams, Michael F. Cronin 1998-03-24
5362600 Radiation sensitive compositions comprising polymer having acid labile groups Roger F. Sinta, Richard C. Hemond, David R. Medeiros, James W. Thackeray, Dianne Canistro 1994-11-08
5344742 Benzyl-substituted photoactive compounds and photoresist compositions comprising same Roger F. Sinta, George G. Barclay 1994-09-06
5258257 Radiation sensitive compositions comprising polymer having acid labile groups Roger F. Sinta, Richard C. Hemond, David R. Medeiros, James W. Thackeray, Dianne Canistro 1993-11-02