Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9783901 | Electroplating of metals on conductive oxide substrates | — | 2017-10-10 |
| 9443713 | Oxidizing aqueous cleaner for the removal of post-etch residues | Michael B. Korzenski, Martha M. Rajaratnam | 2016-09-13 |
| 9422513 | Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition | Melissa K. Rath, David Bernhard, Thomas H. Baum | 2016-08-23 |
| 9256134 | Photoresist removal | Melissa K. Rath, David Bernhard, Thomas H. Baum | 2016-02-09 |
| 8956687 | Light induced plating of metals on silicon photovoltaic cells | Lev Taytsas | 2015-02-17 |
| 8951948 | Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition | Melissa K. Rath, David Bernhard, Thomas H. Baum | 2015-02-10 |
| 8765654 | Oxidizing aqueous cleaner for the removal of post-etch residues | Michael B. Korzenski, Martha M. Rajaratnam | 2014-07-01 |
| 8722142 | Light induced electroless plating | — | 2014-05-13 |
| 8679734 | Photoresist removal | Melissa K. Rath, David Bernhard, Thomas H. Baum | 2014-03-25 |
| 8337942 | Light induced plating of metals on silicon photovoltaic cells | Lev Taytsas | 2012-12-25 |
| 8338087 | Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate | Melissa K. Rath, David Bernhard, Michael B. Korzenski, Thomas H. Baum | 2012-12-25 |
| 8236485 | Photoresist removal | Melissa Murphy, David Bernhard, Thomas H. Baum | 2012-08-07 |
| 7994108 | Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings | Weihua Wang, David Bernhard, Thomas H. Baum, Melissa K. Rath | 2011-08-09 |
| 7922824 | Oxidizing aqueous cleaner for the removal of post-etch residues | Michael B. Korzenski, Martha M. Rajaratnam | 2011-04-12 |
| 7326673 | Treatment of semiconductor substrates using long-chain organothiols or long-chain acetates | Chongying Xu, Thomas H. Baum, Matthew Healy | 2008-02-05 |
| 7119052 | Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafers | Michael B. Korzenski, Chongying Xu, Thomas H. Baum, Eliodor G. Ghenciu | 2006-10-10 |
| 6849200 | Composition and process for wet stripping removal of sacrificial anti-reflective material | Thomas H. Baum, David Bernhard, Melissa Murphy | 2005-02-01 |
| 6824952 | Deep-UV anti-reflective resist compositions | Daniel J. Nawrocki | 2004-11-30 |
| 6773873 | pH buffered compositions useful for cleaning residue from semiconductor substrates | Ma. Fatima Seijo, William A. Wojtczak, David Bernhard, Thomas H. Baum | 2004-08-10 |
| 6716568 | Epoxy photoresist composition with improved cracking resistance | Eric Alemy | 2004-04-06 |