MS

Ma. Fatima Seijo

AC Advanced Technology & Materials Co.: 10 patents #47 of 410Top 15%
📍 Hayward, CA: #141 of 1,120 inventorsTop 15%
🗺 California: #55,401 of 386,348 inventorsTop 15%
Overall (All Time): #463,736 of 4,157,543Top 15%
11
Patents All Time

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
9109188 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate William A. Wojtczak, David Bernhard, Long Nguyen 2015-08-18
7662762 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrates William A. Wojtczak, David Bernhard, Long Nguyen 2010-02-16
7605113 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate William A. Wojtczak, David Bernhard, Long Nguyen 2009-10-20
7534752 Post plasma ashing wafer cleaning formulation Daniel Fine, Thomas Kloffenstein, William A. Wojtczak 2009-05-19
6967169 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate William A. Wojtczak, David Bernhard, Long Nguyen 2005-11-22
6896826 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate William A. Wojtczak, David Bernhard, Long Nguyen 2005-05-24
6773873 pH buffered compositions useful for cleaning residue from semiconductor substrates William A. Wojtczak, David Bernhard, Thomas H. Baum, David W. Minsek 2004-08-10
6755989 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate William A. Wojtczak, David Bernhard, Long Nguyen 2004-06-29
6660700 Formulations including a 1,3-dicarbonyl compound chelating agent and copper corrosion inhibiting agents for stripping residues from semiconductor substrates containing copper structures William A. Wojtczak, David Bernhard, Long Nguyen 2003-12-09
6566315 Formulations including a 1,3-dicarbonyl compound chelating agent and copper corrosion inhibiting agents for stripping residues from semiconductor substrates containing copper structures William A. Wojtczak, Dave Bernhard, Long Nguyen 2003-05-20
6344432 Formulations including a 1,3-dicarbonyl compound chelating agent and copper corrosion inhibiting agents for stripping residues from semiconductor substrates containing copper structures William A. Wojtczak, David Bernhard, Long Nguyen 2002-02-05