Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11915983 | Structures and methods of fabricating electronic devices using separation and charge depletion techniques | Leo Mathew, Rajesh A. Rao, Vishal P. Trivedi | 2024-02-27 |
| 11610819 | Structures and methods of fabricating electronic devices using separation and charge depletion techniques | Leo Mathew, Rajesh A. Rao, Vishal P. Trivedi | 2023-03-21 |
| 11098351 | Apparatus and methods for multi-step channel emulsification | Nicolas Arab, Arnold Estrada, Ross JOHNSON | 2021-08-24 |
| 10987500 | Nanochanneled device with electrodes and related methods | Alessandro Grattoni, Mauro Ferrari, Xuewu Liu, Randal GOODALL, Sharath Hosali | 2021-04-27 |
| 10662470 | Apparatus and methods for multi-step channel emulsification | Nicolas Arab, Arnold Estrada, Ross JOHNSON | 2020-05-26 |
| 9526824 | Nanochanneled device and related methods | Mauro Ferrari, Xuewu Liu, Alessandro Grattoni, Randy Goodall, Sharath Hosali +2 more | 2016-12-27 |
| 8480637 | Nanochanneled device and related methods | Mauro Ferrari, Xuewu Liu, Alessandro Grattoni, Randy Goodall, Sharath Hosali +2 more | 2013-07-09 |
| 7538538 | Method of using a four terminal hybrid silicon/organic field effect sensor device | Ananth Dodabalapur, Deepak Sharma | 2009-05-26 |
| 7534752 | Post plasma ashing wafer cleaning formulation | Ma. Fatima Seijo, Thomas Kloffenstein, William A. Wojtczak | 2009-05-19 |
| 7397072 | Structure for and method of using a four terminal hybrid silicon/organic field effect sensor device | Ananth Dodabalapur, Deepak Sharma | 2008-07-08 |
| 6323168 | Post plasma ashing wafer cleaning formulation | Thomas Kloffenstein | 2001-11-27 |
| 6224785 | Aqueous ammonium fluoride and amine containing compositions for cleaning inorganic residues on semiconductor substrates | William A. Wojtczak, George Guan, Stephen A. Fine | 2001-05-01 |