WW

William A. Wojtczak

AC Advanced Technology & Materials Co.: 24 patents #14 of 410Top 4%
FU Fujifilm Electronic Materials U.S.A.: 21 patents #2 of 77Top 3%
FU Fujifilm: 2 patents #2,431 of 4,519Top 55%
SA Sachem: 2 patents #11 of 39Top 30%
🗺 Texas: #1,834 of 125,132 inventorsTop 2%
Overall (All Time): #58,266 of 4,157,543Top 2%
48
Patents All Time

Issued Patents All Time

Showing 1–25 of 48 patents

Patent #TitleCo-InventorsDate
11639487 Cleaning formulation for removing residues on surfaces Tomonori Takahashi, Bing Du, Thomas Dory, Emil A. Kneer 2023-05-02
11618867 Cleaning formulation for removing residues on surfaces Tomonori Takahashi, Bing Du, Thomas Dory, Emil A. Kneer 2023-04-04
11508569 Surface treatment compositions and methods Kazutaka Takahashi, Atsushi Mizutani, Thomas Dory, Keeyoung Park 2022-11-22
11499099 Etching composition Kazutaka Takahashi, Tomonori Takahashi 2022-11-15
11447642 Methods of using surface treatment compositions Atsushi Mizutani, Keeyoung Park 2022-09-20
11401487 Cleaning formulation for removing residues on surfaces Tomonori Takahashi, Bing Du, Thomas Dory, Emil A. Kneer 2022-08-02
11286444 Cleaning formulation for removing residues on surfaces Tomonori Takahashi, Bing Du, Thomas Dory, Emil A. Kneer 2022-03-29
11208616 Stripping compositions for removing photoresists from semiconductor substrates Atsushi Mizutani, Yasuo Sugishima, Raj Sakamuri 2021-12-28
11174394 Surface treatment compositions and articles containing same Atsushi Mizutani, Keeyoung Park 2021-11-16
10947484 Stripping compositions for removing photoresists from semiconductor substrates Atsushi Mizutani, Yasuo Sugishima 2021-03-16
10927329 Cleaning formulation for removing residues on surfaces Tomonori Takahashi, Bing Du, Thomas Dory, Emil A. Kneer 2021-02-23
10696933 Cleaning formulation for removing residues on surfaces Tomonori Takahashi, Bing Du, Thomas Dory, Emil A. Kneer 2020-06-30
10593538 Surface treatment methods and compositions therefor Keeyoung Park, Atsushi Mizutani 2020-03-17
10415005 Cleaning formulation for removing residues on surfaces Tomonori Takahashi, Bing Du, Thomas Dory, Emil A. Kneer 2019-09-17
10266799 Stripping compositions for removing photoresists from semiconductor substrates Atsushi Mizutani, Yasuo Sugishima 2019-04-23
10253282 Cleaning formulation for removing residues on surfaces Tomonori Takahashi, Bing Du, Thomas Dory, Emil A. Kneer 2019-04-09
9914902 Stripping compositions for removing photoresists from semiconductor substrates Bing Du, Thomas Dory 2018-03-13
9562211 Cleaning formulation for removing residues on surfaces Tomonori Takahashi, Bing Du, Thomas Dory, Emil A. Kneer 2017-02-07
9200372 Passivation composition and process Bing Du, Tomonori Takahashi 2015-12-01
9109188 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate Ma. Fatima Seijo, David Bernhard, Long Nguyen 2015-08-18
8889025 Etching composition Tomonori Takahashi, Tadashi Inaba, Atsushi Mizutani, Bing Du, Kazutaka Takahashi +1 more 2014-11-18
8647523 Etching composition Tomonori Takahashi, Tadashi Inaba, Atsushi Mizutani, Bing Du, Kazutaka Takahashi +1 more 2014-02-11
8293694 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate Ma. Fatimo Seijo, David Bernhard, Long Nguyen 2012-10-23
7994062 Selective silicon etch process Sian Collins 2011-08-09
7662762 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrates Ma. Fatima Seijo, David Bernhard, Long Nguyen 2010-02-16