Issued Patents All Time
Showing 26–48 of 48 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7605113 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | Ma. Fatima Seijo, David Bernhard, Long Nguyen | 2009-10-20 |
| 7534752 | Post plasma ashing wafer cleaning formulation | Daniel Fine, Ma. Fatima Seijo, Thomas Kloffenstein | 2009-05-19 |
| 7192910 | Cleaning solutions and etchants and methods for using same | Dean Dewulf, Sian Collins | 2007-03-20 |
| 7029373 | Chemical mechanical polishing compositions for metal and associated materials and method of using same | Ying Ma, Cary Regulski, Thomas H. Baum, David Bernhard, Deepak Verma | 2006-04-18 |
| 6967169 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | Ma. Fatima Seijo, David Bernhard, Long Nguyen | 2005-11-22 |
| 6936542 | Polishing slurries for copper and associated materials | Thomas H. Baum, Long Nguyen, Cary Regulski | 2005-08-30 |
| 6896826 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | Ma. Fatima Seijo, David Bernhard, Long Nguyen | 2005-05-24 |
| 6875733 | Ammonium borate containing compositions for stripping residues from semiconductor substrates | George Guan | 2005-04-05 |
| 6773873 | pH buffered compositions useful for cleaning residue from semiconductor substrates | Ma. Fatima Seijo, David Bernhard, Thomas H. Baum, David W. Minsek | 2004-08-10 |
| 6755989 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | Ma. Fatima Seijo, David Bernhard, Long Nguyen | 2004-06-29 |
| 6692546 | Chemical mechanical polishing compositions for metal and associated materials and method of using same | Ying Ma, Cary Regulski, Thomas H. Baum, David Bernhard, Deepak Verma | 2004-02-17 |
| 6660700 | Formulations including a 1,3-dicarbonyl compound chelating agent and copper corrosion inhibiting agents for stripping residues from semiconductor substrates containing copper structures | Ma. Fatima Seijo, David Bernhard, Long Nguyen | 2003-12-09 |
| 6599870 | Boric acid containing compositions for stripping residues from semiconductor substrates | George Guan, Long Nguyen | 2003-07-29 |
| 6566315 | Formulations including a 1,3-dicarbonyl compound chelating agent and copper corrosion inhibiting agents for stripping residues from semiconductor substrates containing copper structures | Ma. Fatima Seijo, Dave Bernhard, Long Nguyen | 2003-05-20 |
| 6527819 | Polishing slurries for copper and associated materials | Thomas H. Baum, Long Nguyen, Cary Regulski | 2003-03-04 |
| 6492310 | Boric acid containing compositions for stripping residues from semiconductor substrates | George Guan, Long Nguyen | 2002-12-10 |
| 6409781 | Polishing slurries for copper and associated materials | Thomas H. Baum, Long Nguyen, Cary Regulski | 2002-06-25 |
| 6383410 | Selective silicon oxide etchant formulation including fluoride salt, chelating agent, and glycol solvent | Long Nguyen, Stephen A. Fine | 2002-05-07 |
| 6344432 | Formulations including a 1,3-dicarbonyl compound chelating agent and copper corrosion inhibiting agents for stripping residues from semiconductor substrates containing copper structures | Ma. Fatima Seijo, David Bernhard, Long Nguyen | 2002-02-05 |
| 6306807 | Boric acid containing compositions for stripping residues from semiconductor substrates | George Guan, Long Nguyen | 2001-10-23 |
| 6280651 | Selective silicon oxide etchant formulation including fluoride salt, chelating agent, and glycol solvent | Long Nguyen, Stephen A. Fine | 2001-08-28 |
| 6224785 | Aqueous ammonium fluoride and amine containing compositions for cleaning inorganic residues on semiconductor substrates | George Guan, Daniel Fine, Stephen A. Fine | 2001-05-01 |
| 6211126 | Formulations including a 1, 3-dicarbonyl compound chelating agent for stripping residues from semiconductor substrates | George Guan, Stephen A. Fine | 2001-04-03 |