Issued Patents All Time
Showing 25 most recent of 256 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12359309 | Group VI metal deposition process | Philip S. H. Chen, Shawn D. Nguyen, Bryan C. Hendrix | 2025-07-15 |
| 12312678 | Methods for depositing a tungsten or molybdenum layer in the presence of a reducing co-reactant | Robert Wright, Jr., Bryan C. Hendrix, James WOECKENER | 2025-05-27 |
| 12297217 | Process for preparing organotin compounds | David M. Ermert, Thomas M. Cameron, David Kuiper | 2025-05-13 |
| 12258356 | Group VI precursor compounds | David M. Ermert, Robert Wright, Jr. | 2025-03-25 |
| 12252787 | Methods for depositing tungsten or molybdenum films | Robert Wright, Jr., Bryan C. Hendrix, Shawn D. Nguyen, Han Wang, Philip S. H. Chen | 2025-03-18 |
| 12237170 | Haloalkynyl dicobalt hexacarbonyl precursors for chemical vapor deposition of cobalt | Sangbum Han, Seobong Chang, Bryan C. Hendrix, Jaeeon Park | 2025-02-25 |
| 12209105 | Vapor deposition precursor compounds and process of use | Philip S. H. Chen, Eric Condo, Bryan C. Hendrix, David Kuiper | 2025-01-28 |
| 12173014 | Group VI precursor compounds | David M. Ermert | 2024-12-24 |
| 12071688 | Precursors and methods for preparing silicon-containing films | Sangjin Lee, Dahye Kim, Sungsil Cho, Seobong Chang, Jae-eon Park +2 more | 2024-08-27 |
| 12037681 | Method for forming carbon rich silicon-containing films | Sungsil Cho, Seobong Chang, Jae-eon Park, Bryan C. Hendrix | 2024-07-16 |
| 11987878 | Chemical vapor deposition processes using ruthenium precursor and reducing gas | Philip S. H. Chen, Bryan C. Hendrix | 2024-05-21 |
| 11965239 | Method for nucleation of conductive nitride films | Gavin Charles Richards, Han Wang, Bryan C. Hendrix | 2024-04-23 |
| 11919780 | Oxyhalide precursors | David M. Ermert, Robert Wright, Jr., Bryan C. Hendrix | 2024-03-05 |
| 11807653 | Group VI precursor compounds | David M. Ermert, Robert Wright, Jr. | 2023-11-07 |
| 11804375 | Haloalkynyl dicobalt hexacarbonyl precursors for chemical vapor deposition of cobalt | Sangbum Han, Seobong Chang, Bryan C. Hendrix, Jaeeon Park | 2023-10-31 |
| 11761086 | Cobalt precursors | Scott L. Battle, John M. Cleary, David W. Peters, Philip S. H. Chen | 2023-09-19 |
| 11761081 | Methods for depositing tungsten or molybdenum films | Robert Wright, Jr., Bryan C. Hendrix, Shawn D. Nguyen, Han Wang, Philip S. H. Chen | 2023-09-19 |
| 11685752 | Process for preparing organotin compounds | David M. Ermert, Thomas M. Cameron | 2023-06-27 |
| 11624111 | Method for etching or deposition | Robert Wright, Jr., David M. Ermert | 2023-04-11 |
| 11560625 | Vapor deposition of molybdenum using a bis(alkyl-arene) molybdenum precursor | Robert Wright, Jr., Shuang Meng, Bryan C. Hendrix, Philip S. H. Chen | 2023-01-24 |
| 11560397 | Group VI precursor compounds | David M. Ermert | 2023-01-24 |
| 11492364 | Silicon hydrazido precursor compounds | Manish Khandelwal | 2022-11-08 |
| 11466038 | Vapor deposition precursor compounds and process of use | Philip S. H. Chen, Eric Condo, Bryan C. Hendrix, David Kuiper | 2022-10-11 |
| 11414750 | Method for forming carbon rich silicon-containing films | Sungsil Cho, Seobong Chang, Jae-eon Park, Bryan C. Hendrix | 2022-08-16 |
| 11380539 | Selective deposition of silicon nitride | Han Wang, Bryan C. Hendrix, Eric Condo | 2022-07-05 |