Issued Patents All Time
Showing 1–25 of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12359309 | Group VI metal deposition process | Shawn D. Nguyen, Bryan C. Hendrix, Thomas H. Baum | 2025-07-15 |
| 12264392 | Silicon precursor compounds and method for forming silicon-containing films | Sungsil Cho, Dahye Kim, Soojin Lee, Jae-eon Park, Bryan C. Hendrix +1 more | 2025-04-01 |
| 12252787 | Methods for depositing tungsten or molybdenum films | Robert Wright, Jr., Thomas H. Baum, Bryan C. Hendrix, Shawn D. Nguyen, Han Wang | 2025-03-18 |
| 12209105 | Vapor deposition precursor compounds and process of use | Eric Condo, Bryan C. Hendrix, Thomas H. Baum, David Kuiper | 2025-01-28 |
| 11987878 | Chemical vapor deposition processes using ruthenium precursor and reducing gas | Bryan C. Hendrix, Thomas H. Baum | 2024-05-21 |
| 11761081 | Methods for depositing tungsten or molybdenum films | Robert Wright, Jr., Thomas H. Baum, Bryan C. Hendrix, Shawn D. Nguyen, Han Wang | 2023-09-19 |
| 11761086 | Cobalt precursors | Thomas H. Baum, Scott L. Battle, John M. Cleary, David W. Peters | 2023-09-19 |
| 11560625 | Vapor deposition of molybdenum using a bis(alkyl-arene) molybdenum precursor | Robert Wright, Jr., Shuang Meng, Bryan C. Hendrix, Thomas H. Baum | 2023-01-24 |
| 11476158 | Cobalt deposition selectivity on copper and dielectrics | William Hunks, Steven Lippy, Ruben Lieten | 2022-10-18 |
| 11466038 | Vapor deposition precursor compounds and process of use | Eric Condo, Bryan C. Hendrix, Thomas H. Baum, David Kuiper | 2022-10-11 |
| 11371138 | Chemical vapor deposition processes using ruthenium precursor and reducing gas | Bryan C. Hendrix, Thomas H. Baum | 2022-06-28 |
| 11107675 | CVD Mo deposition by using MoOCl4 | Thomas H. Baum, Robert Wright, Jr., Bryan C. Hendrix, Shuang Meng, Richard Assion | 2021-08-31 |
| 10793947 | Alloys of Co to reduce stress | Bryan C. Hendrix, Thomas H. Baum | 2020-10-06 |
| 10186570 | ALD processes for low leakage current and low equivalent oxide thickness BiTaO films | Bryan C. Hendrix, Weimin Li, Woosung Jang, Dingkai Guo | 2019-01-22 |
| 9997362 | Cobalt CVD | Thomas H. Baum, Scott L. Battle, David W. Peters | 2018-06-12 |
| 9537095 | Tellurium compounds useful for deposition of tellurium containing materials | Matthias Stender, Chongying Xu, Tianniu Chen, William Hunks, Jeffrey F. Roeder +1 more | 2017-01-03 |
| 9219232 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum +3 more | 2015-12-22 |
| 9034688 | Antimony compounds useful for deposition of antimony-containing materials | Tianniu Chen, William Hunks, Chongying Xu, Leah Maylott | 2015-05-19 |
| 8796068 | Tellurium compounds useful for deposition of tellurium containing materials | Matthias Stender, Chongying Xu, Tianniu Chen, William Hunks, Jeffrey F. Roeder +1 more | 2014-08-05 |
| 8709863 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum +3 more | 2014-04-29 |
| 8674127 | Antimony compounds useful for deposition of antimony-containing materials | Tianniu Chen, William Hunks, Chongying Xu, Leah Maylott | 2014-03-18 |
| 8330136 | High concentration nitrogen-containing germanium telluride based memory devices and processes of making | Jun Zheng, Jeffrey F. Roeder, Weimin Li | 2012-12-11 |
| 8268665 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum +3 more | 2012-09-18 |
| 8109130 | Apparatus and process for sensing fluoro species in semiconductor processing systems | Frank Dimeo, Jr., Jeffrey W. Neuner, James Welch, Michele Stawasz, Thomas H. Baum +3 more | 2012-02-07 |
| 8093140 | Amorphous Ge/Te deposition process | William Hunks, Tianniu Chen, Matthias Stender, Chongying Xu, Jeffrey F. Roeder +1 more | 2012-01-10 |