Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11978622 | Aqueous and semi-aqueous cleaners for the removal of post-etch residues with tungsten and cobalt compatibility | Lingyan Song, Emanuel I. Cooper | 2024-05-07 |
| 11492709 | Method and composition for etching molybdenum | Atanu K. Das, Daniela White, Emanuel I. Cooper, Eric Hong, JeongYeol Yang +5 more | 2022-11-08 |
| 11476158 | Cobalt deposition selectivity on copper and dielectrics | Philip S. H. Chen, William Hunks, Ruben Lieten | 2022-10-18 |
| 11346008 | Ruthenium etching composition and method | Emanuel I. Cooper | 2022-05-31 |
| 10920141 | Compositions and methods for selectively etching titanium nitride | Li-Min Chen, Emanuel I. Cooper, Lingyan Song | 2021-02-16 |
| 10472567 | Compositions and methods for selectively etching titanium nitride | Li-Min Chen, Emanuel I. Cooper, Lingyan Song, Chia-Jung Hsu, Sheng-Hung Tu +1 more | 2019-11-12 |
| 10460954 | Anti-reflective coating cleaning and post-etch residue removal composition having metal, dielectric and nitride compatibility | Emanuel I. Cooper, Lingyan Song | 2019-10-29 |
| 10428271 | Compositions and methods for selectively etching titanium nitride | Emanuel I. Cooper, Li-Min Chen, Chia-Jung Hsu, Sheng-Hung Tu, Chieh-Ju Wang | 2019-10-01 |
| 10392560 | Compositions and methods for selectively etching titanium nitride | Jeffrey A. Barnes, Emanuel I. Cooper, Li-Min Chen, Rekha Rajaram, Sheng-Hung Tu | 2019-08-27 |
| 10138117 | Aqueous formulations for removing metal hard mask and post-etch residue with Cu/W compatibility | Li-Min Chen, Daniela White, Emanuel I. Cooper | 2018-11-27 |
| 9831088 | Composition and process for selectively etching metal nitrides | Tianniu Chen, Nicole E. Thomas, Jeffrey A. Barnes, Emanuel I. Cooper, Peng Zhang | 2017-11-28 |
| 9546321 | Compositions and methods for selectively etching titanium nitride | Jeffrey A. Barnes, Emanuel I. Cooper, Li-Min Chen, Rekha Rajaram, Sheng-Hung Tu | 2017-01-17 |
| 9063431 | Aqueous cleaner for the removal of post-etch residues | Jeffrey A. Barnes, Peng Zhang, Rekha Rajaram | 2015-06-23 |
| 8044009 | Compositions for cleaning ion implanted photoresist in front end of line applications | Sean Kane | 2011-10-25 |