Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11476158 | Cobalt deposition selectivity on copper and dielectrics | Philip S. H. Chen, Steven Lippy, Ruben Lieten | 2022-10-18 |
| 10870921 | Cyclopentadienyl titanium alkoxides with ozone activated ligands for ALD of TiO2 | Thomas M. Cameron | 2020-12-22 |
| 10043658 | Precursors for silicon dioxide gap fill | Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Steven M. Bilodeau, Weimin Li | 2018-08-07 |
| 9637395 | Fluorine free tungsten ALD/CVD process | Weimin Li, David W. Peters, Scott L. Battle | 2017-05-02 |
| 9537095 | Tellurium compounds useful for deposition of tellurium containing materials | Matthias Stender, Chongying Xu, Tianniu Chen, Philip S. H. Chen, Jeffrey F. Roeder +1 more | 2017-01-03 |
| 9373677 | Doping of ZrO2 for DRAM applications | Julie Cissell, Chongying Xu, Thomas M. Cameron, David W. Peters | 2016-06-21 |
| 9337054 | Precursors for silicon dioxide gap fill | Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Steven M. Bilodeau, Weimin Li | 2016-05-10 |
| 9269582 | Cluster ion implantation of arsenic and phosphorus | Oleg Byl, Chongying Xu, Richard S. Ray | 2016-02-23 |
| 9219232 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum, Matthias Stender +3 more | 2015-12-22 |
| 9034688 | Antimony compounds useful for deposition of antimony-containing materials | Tianniu Chen, Philip S. H. Chen, Chongying Xu, Leah Maylott | 2015-05-19 |
| 8877549 | Low temperature deposition of phase change memory materials | Jeffrey F. Roeder, Thomas H. Baum, Bryan C. Hendrix, Gregory T. Stauf, Chongying Xu +2 more | 2014-11-04 |
| 8796068 | Tellurium compounds useful for deposition of tellurium containing materials | Matthias Stender, Chongying Xu, Tianniu Chen, Philip S. H. Chen, Jeffrey F. Roeder +1 more | 2014-08-05 |
| 8709863 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum, Matthias Stender +3 more | 2014-04-29 |
| 8679894 | Low temperature deposition of phase change memory materials | Jeffrey F. Roeder, Thomas H. Baum, Bryan C. Hendrix, Gregory T. Stauf, Chongying Xu +2 more | 2014-03-25 |
| 8674127 | Antimony compounds useful for deposition of antimony-containing materials | Tianniu Chen, Philip S. H. Chen, Chongying Xu, Leah Maylott | 2014-03-18 |
| 8288198 | Low temperature deposition of phase change memory materials | Jeffrey F. Roeder, Thomas H. Baum, Bryan C. Hendrix, Gregory T. Stauf, Chongying Xu +2 more | 2012-10-16 |
| 8268665 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum, Matthias Stender +3 more | 2012-09-18 |
| 8093140 | Amorphous Ge/Te deposition process | Philip S. H. Chen, Tianniu Chen, Matthias Stender, Chongying Xu, Jeffrey F. Roeder +1 more | 2012-01-10 |
| 8053375 | Super-dry reagent compositions for formation of ultra low k films | Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum, Steven M. Bilodeau, Scott L. Battle +1 more | 2011-11-08 |
| 8008117 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum, Melissa A. Petruska +4 more | 2011-08-30 |
| 7838329 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum, Melissa A. Petruska +4 more | 2010-11-23 |