Issued Patents All Time
Showing 1–25 of 53 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12298669 | Composition comprising three alkanolamines and a hydroxylamine for removing etch residues | Laisheng Sun, Lili Wang, Aiping Wu, Yi-Chia Lee | 2025-05-13 |
| 11062906 | Silicon implantation in substrates and provision of silicon precursor compositions therefor | Ying Tang, Joseph D. Sweeney, James J. Mayer, Richard S. Ray, Oleg Byl +2 more | 2021-07-13 |
| 11035044 | Etching solution for tungsten and GST films | Wen Dar Liu, Laisheng Sun, Yi-Chia Lee, Gang C. Han-Adebekun | 2021-06-15 |
| 10954480 | Compositions and methods for preventing collapse of high aspect ratio structures during drying | Jhih Kuei Ge, Yi-Chia Lee, Wen Dar Liu | 2021-03-23 |
| 10711227 | TiN hard mask and etch residue removal | Wen Dar Liu, Yi-Chia Lee, William Jack Casteel, Jr., Rajiv Krishan Agarwal, Madhukar Bhaskara Rao | 2020-07-14 |
| 10400167 | Etching compositions and methods for using same | Wen Dar Liu, Yi-Chia Lee, Thomas Mebrahtu, Aiping Wu, Edward Tseng +1 more | 2019-09-03 |
| 10332784 | Selectively removing titanium nitride hard mask and etch residue removal | William Jack Casteel, Jr., Seiji Inaoka, Wen Dar Liu | 2019-06-25 |
| 10301580 | Stripping compositions having high WN/W etching selectivity | Wen Dar Liu, Yi-Chia Lee, William Jack Casteel, Jr., Seiji Inaoka, Gene Everad Parris | 2019-05-28 |
| 10072237 | Photoresist cleaning composition used in photolithography and a method for treating substrate therewith | Randy Li-Kai Chang, Gene Everad Parris, Hsiu-Mei Chen, Yi-Chia Lee, Wen Dar Liu +3 more | 2018-09-11 |
| 9976037 | Composition for treating surface of substrate, method and device | Seiji Inaoka, William Jack Casteel, Jr., Raymond Nicholas Vrtis, Kathleen Esther Theodorou, Mark Richard Brown | 2018-05-22 |
| 9976111 | TiN hard mask and etch residual removal | Wen Dar Liu, Yi-Chia Lee, William Jack Casteel, Jr., Rajiv Krishan Agarwal, Madhukar Bhaskara Rao | 2018-05-22 |
| 9873833 | Etchant solutions and method of use thereof | Gene Everad Parris, William Jack Casteel, Jr. | 2018-01-23 |
| 9831088 | Composition and process for selectively etching metal nitrides | Nicole E. Thomas, Steven Lippy, Jeffrey A. Barnes, Emanuel I. Cooper, Peng Zhang | 2017-11-28 |
| 9783558 | Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films | Ziyun Wang, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Thomas H. Baum | 2017-10-10 |
| 9731368 | Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipment | Michael B. Korzenski, Ping Jiang | 2017-08-15 |
| 9649712 | Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipment | Michael B. Korzenski, Ping Jiang | 2017-05-16 |
| 9537095 | Tellurium compounds useful for deposition of tellurium containing materials | Matthias Stender, Chongying Xu, William Hunks, Philip S. H. Chen, Jeffrey F. Roeder +1 more | 2017-01-03 |
| 9534285 | Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films | Chongying Xu, Thomas M. Cameron, Jeffrey F. Roeder, Thomas H. Baum | 2017-01-03 |
| 9472420 | Composition for titanium nitride hard mask and etch residue removal | William Jack Casteel, Jr., Seiji Inaoka, Madhukar Bhaskara Rao, Brenda Faye Ross, Yi-Chia Lee +1 more | 2016-10-18 |
| 9222018 | Titanium nitride hard mask and etch residue removal | William Jack Casteel, Jr., Seiji Inaoka, Wen Dar Liu | 2015-12-29 |
| 9221114 | Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipment | Michael B. Korzenski, Ping Jiang | 2015-12-29 |
| 9219232 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum, Matthias Stender +3 more | 2015-12-22 |
| 9102693 | Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films | Ziyun Wang, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Thomas H. Baum | 2015-08-11 |
| 9074169 | Lithographic tool in situ clean formulations | Steven M. Bilodeau, Karl E. Boggs, Ping Jiang, Michael B. Korzenski, George Mirth +1 more | 2015-07-07 |
| 9034688 | Antimony compounds useful for deposition of antimony-containing materials | William Hunks, Philip S. H. Chen, Chongying Xu, Leah Maylott | 2015-05-19 |