Issued Patents All Time
Showing 1–25 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12281251 | Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device | Jhih Kuei Ge, Yi-Chia Lee, Aiping Wu, Laisheng Sun | 2025-04-22 |
| 12110435 | Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device | Jhih Kuei Ge, Yi-Chia Lee, Aiping Wu, Laisheng Sun | 2024-10-08 |
| 12110436 | Co/Cu selective wet etchant | Chung-Yi Chang, Yi-Chia Lee | 2024-10-08 |
| 11955341 | Etching solution and method for selectively removing silicon nitride during manufacture of a semiconductor device | Jhih Kuei Ge, Yi-Chia Lee | 2024-04-09 |
| 11946148 | Hafnium oxide corrosion inhibitor | Yi-Chia Lee | 2024-04-02 |
| 11929257 | Etching solution and method for aluminum nitride | Chung-Yi Chang, Yi-Chia Lee | 2024-03-12 |
| 11499236 | Etching solution for tungsten word line recess | Jhih Kuei Ge, Yi-Chia Lee | 2022-11-15 |
| 11186771 | Etching solution for selectively removing silicon nitride during manufacture of a semiconductor device | Yi-Chia Lee | 2021-11-30 |
| 11180697 | Etching solution having silicon oxide corrosion inhibitor and method of using the same | Yi-Chia Lee, Chung-Yi Chang | 2021-11-23 |
| 11175587 | Stripper solutions and methods of using stripper solutions | Jhih Kuei Ge, Yi-Chia Lee, Chi-Hsien Kuo | 2021-11-16 |
| 11035044 | Etching solution for tungsten and GST films | Laisheng Sun, Yi-Chia Lee, Tianniu Chen, Gang C. Han-Adebekun | 2021-06-15 |
| 11017995 | Composition for TiN hard mask removal and etch residue cleaning | Chao-Hsiang Chen, Yi-Chia Lee, Chung-Yi Chang | 2021-05-25 |
| 10954480 | Compositions and methods for preventing collapse of high aspect ratio structures during drying | Jhih Kuei Ge, Yi-Chia Lee, Tianniu Chen | 2021-03-23 |
| 10934484 | Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/ germanium stack during manufacture of a semiconductor device | Yi-Chia Lee | 2021-03-02 |
| 10934485 | Etching solution for selectively removing silicon over silicon-germanium alloy from a silicon-germanium/ silicon stack during manufacture of a semiconductor device | Yi-Chia Lee, Andrew J. Adamczyk | 2021-03-02 |
| 10879076 | Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/silicon stack during manufacture of a semiconductor device | Yi-Chia Lee, Andrew J. Adamczyk | 2020-12-29 |
| 10870799 | Etching solution for selectively removing tantalum nitride over titanium nitride during manufacture of a semiconductor device | Yi-Chia Lee | 2020-12-22 |
| 10711227 | TiN hard mask and etch residue removal | Yi-Chia Lee, William Jack Casteel, Jr., Tianniu Chen, Rajiv Krishan Agarwal, Madhukar Bhaskara Rao | 2020-07-14 |
| 10647950 | Cleaning formulations | Seiji Inaoka, William Jack Casteel, Jr. | 2020-05-12 |
| 10400167 | Etching compositions and methods for using same | Yi-Chia Lee, Tianniu Chen, Thomas Mebrahtu, Aiping Wu, Edward Tseng +1 more | 2019-09-03 |
| 10332784 | Selectively removing titanium nitride hard mask and etch residue removal | William Jack Casteel, Jr., Seiji Inaoka, Tianniu Chen | 2019-06-25 |
| 10301580 | Stripping compositions having high WN/W etching selectivity | Yi-Chia Lee, Tianniu Chen, William Jack Casteel, Jr., Seiji Inaoka, Gene Everad Parris | 2019-05-28 |
| 10072237 | Photoresist cleaning composition used in photolithography and a method for treating substrate therewith | Randy Li-Kai Chang, Gene Everad Parris, Hsiu-Mei Chen, Yi-Chia Lee, Tianniu Chen +3 more | 2018-09-11 |
| 9976111 | TiN hard mask and etch residual removal | Yi-Chia Lee, William Jack Casteel, Jr., Tianniu Chen, Rajiv Krishan Agarwal, Madhukar Bhaskara Rao | 2018-05-22 |
| 9957469 | Copper corrosion inhibition system | Seiji Inaoka, Yi-Chia Lee, Agnes Derecskei-Kovacs | 2018-05-01 |