Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12325844 | Photoresist remover | Yuanmei Cao, Michael T. Phenis, Lili Wang, Aiping Wu | 2025-06-10 |
| 12298669 | Composition comprising three alkanolamines and a hydroxylamine for removing etch residues | Lili Wang, Aiping Wu, Yi-Chia Lee, Tianniu Chen | 2025-05-13 |
| 12281251 | Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device | Jhih Kuei Ge, Yi-Chia Lee, Wen Dar Liu, Aiping Wu | 2025-04-22 |
| 12110435 | Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device | Jhih Kuei Ge, Yi-Chia Lee, Wen Dar Liu, Aiping Wu | 2024-10-08 |
| 11091727 | Post etch residue cleaning compositions and methods of using the same | Yi-Chia Lee, Lili Wang, Aiping Wu | 2021-08-17 |
| 11035044 | Etching solution for tungsten and GST films | Wen Dar Liu, Yi-Chia Lee, Tianniu Chen, Gang C. Han-Adebekun | 2021-06-15 |
| 10557107 | Post chemical mechanical polishing formulations and method of use | Peng Zhang, Jun Liu, Steven Medd, Jeffrey A. Barnes, Shrane-Ning Jenq | 2020-02-11 |
| 10176979 | Post-CMP removal using compositions and method of use | Jun Liu, Jeffrey A. Barnes, Emanuel I. Cooper, Elizabeth THOMAS, Jason Y.H. Chang | 2019-01-08 |