| RE46427 |
Antioxidants for post-CMP cleaning formulations |
David Angst, Peng Zhang, Jeffrey A. Barnes, Prerna Sonthalia, Emanuel I. Cooper |
2017-06-06 |
| 9528078 |
Antioxidants for post-CMP cleaning formulations |
David Angst, Peng Zhang, Jeffrey A. Barnes, Prerna Sonthalia, Emanuel I. Cooper |
2016-12-27 |
| 9522773 |
Substantially rigid collapsible liner and flexible gusseted or non-gusseted liners and methods of manufacturing the same and methods for limiting choke-off in liners |
Glenn M. Tom, Thomas H. Baum, Matthew Kusz, Joseph P. Menning, Greg Nelson +4 more |
2016-12-20 |
| 9132412 |
Component for solar adsorption refrigeration system and method of making such component |
J. Donald Carruthers, Luping Wang, Shaun M. Wilson, Jose I. Arno, Paul J. Marganski +5 more |
2015-09-15 |
| 9074170 |
Copper cleaning and protection formulations |
Jeffrey A. Barnes, Brian L. Benac, Lin Feng, Jun Liu, Melissa A. Petruska +2 more |
2015-07-07 |
| 9074169 |
Lithographic tool in situ clean formulations |
Tianniu Chen, Steven M. Bilodeau, Ping Jiang, Michael B. Korzenski, George Mirth +1 more |
2015-07-07 |
| 8685909 |
Antioxidants for post-CMP cleaning formulations |
David Angst, Peng Zhang, Jeffrey A. Barnes, Prerna Sonthalia, Emanuel I. Cooper |
2014-04-01 |
| 8618036 |
Aqueous cerium-containing solution having an extended bath lifetime for removing mask material |
Ali Afzali-Ardakani, John A. Fitzsimmons, Nicholas C. M. Fuller, Mahmoud Khojasteh, Jennifer V. Muncy +4 more |
2013-12-31 |
| 8539781 |
Component for solar adsorption refrigeration system and method of making such component |
J. Donald Carruthers, Luping Wang, Shaun M. Wilson, Jose I. Arno, Paul J. Marganski +5 more |
2013-09-24 |
| 8304344 |
High throughput chemical mechanical polishing composition for metal film planarization |
Michael S. Darsillo, Peter Wrschka, James Welch |
2012-11-06 |
| 8236695 |
Method of passivating chemical mechanical polishing compositions for copper film planarization processes |
Jun Liu, Mackenzie King, Michael S. Darsillo, Jeffrey F. Roeder, Peter Wrschka +1 more |
2012-08-07 |
| 7736405 |
Chemical mechanical polishing compositions for copper and associated materials and method of using same |
Michael S. Darsillo, Peter Wrschka |
2010-06-15 |
| 7361603 |
Passivative chemical mechanical polishing composition for copper film planarization |
Jun Liu, Mackenzie King, Michael S. Darsillo, Jeffrey F. Roeder, Thomas H. Baum |
2008-04-22 |
| 7300601 |
Passivative chemical mechanical polishing composition for copper film planarization |
Jun Liu, Peter Wrschka, David Bernhard, Mackenzie King, Michael S. Darsillo |
2007-11-27 |
| 6857434 |
CMP slurry additive for foreign matter detection |
Kwong Hon Wong, Raphael Mitchell, Uldis A. Ziemins |
2005-02-22 |
| 6325696 |
Piezo-actuated CMP carrier |
Kenneth M. Davis, William Francis Landers, Michael F. Lofaro, Adam D. Ticknor, Ronald D. Fiege |
2001-12-04 |
| 6296717 |
Regeneration of chemical mechanical polishing pads in-situ |
Adam D. Ticknor, Kenneth M. Davis, William Francis Landers, Michael L. Passow |
2001-10-02 |
| 6106374 |
Acoustically agitated delivery |
Leonard C. Stevens, Jr. |
2000-08-22 |
| 6102776 |
Apparatus and method for controlling polishing of integrated circuit substrates |
Kenneth M. Davis, William Francis Landers, Robert M. Merkling, Jr., Michael L. Passow, Jeremy K. Stephens |
2000-08-15 |
| 6087191 |
Method for repairing surface defects |
— |
2000-07-11 |
| 5972787 |
CMP process using indicator areas to determine endpoint |
Chenting Lin, Joachim Nuetzel, Robert Ploessl, Maria Ronay, Florian Schnabel +1 more |
1999-10-26 |
