| 9669000 |
Pharmaceutical compositions comprising lignans and their derivatives for treating hyperplastic diseases |
Hermann Stuppner, Stefan Schwaiger, Günther Laufer |
2017-06-06 |
|
| 9422513 |
Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition |
Melissa K. Rath, Thomas H. Baum, David W. Minsek |
2016-08-23 |
|
| 9256134 |
Photoresist removal |
David W. Minsek, Melissa K. Rath, Thomas H. Baum |
2016-02-09 |
|
| 9109188 |
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
William A. Wojtczak, Ma. Fatima Seijo, Long Nguyen |
2015-08-18 |
|
| 8951948 |
Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition |
Melissa K. Rath, Thomas H. Baum, David W. Minsek |
2015-02-10 |
|
| 8765804 |
Pharmaceutical compositions comprising lignans and their derivatives for treating hyperplastic diseases |
Hermann Stuppner, Stefan Schwaiger, Günther Laufer |
2014-07-01 |
|
| 8679734 |
Photoresist removal |
David W. Minsek, Melissa K. Rath, Thomas H. Baum |
2014-03-25 |
$2,780,000 |
| 8338087 |
Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate |
Melissa K. Rath, David W. Minsek, Michael B. Korzenski, Thomas H. Baum |
2012-12-25 |
|
| 8293694 |
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
William A. Wojtczak, Ma. Fatimo Seijo, Long Nguyen |
2012-10-23 |
$4,133,000 |
| 8236485 |
Photoresist removal |
David W. Minsek, Melissa Murphy, Thomas H. Baum |
2012-08-07 |
$1,067,000 |
| 8058219 |
Metals compatible post-etch photoresist remover and/or sacrificial antireflective coating etchant |
Melissa K. Rath, Thomas H. Baum, Ping Jiang, Renjie Zhou, Michael B. Korzenski |
2011-11-15 |
$4,577,000 |
| 7994108 |
Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings |
David W. Minsek, Weihua Wang, Thomas H. Baum, Melissa K. Rath |
2011-08-09 |
$3,205,000 |
| 7888301 |
Resist, barc and gap fill material stripping chemical and method |
Yoichiro Fujita, Tomoe Miyazawa, Makoto Nakajima |
2011-02-15 |
$1,760,000 |
| 7678393 |
Mixture composition and method useful for topical and internal application |
Bradford Ray Duncan |
2010-03-16 |
|
| 7662762 |
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrates |
William A. Wojtczak, Ma. Fatima Seijo, Long Nguyen |
2010-02-16 |
$18,958,000 |
| 7605113 |
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
William A. Wojtczak, Ma. Fatima Seijo, Long Nguyen |
2009-10-20 |
$3,480,000 |
| 7300601 |
Passivative chemical mechanical polishing composition for copper film planarization |
Jun Liu, Peter Wrschka, Mackenzie King, Michael S. Darsillo, Karl E. Boggs |
2007-11-27 |
$14,974,000 |
| 7029373 |
Chemical mechanical polishing compositions for metal and associated materials and method of using same |
Ying Ma, William A. Wojtczak, Cary Regulski, Thomas H. Baum, Deepak Verma |
2006-04-18 |
$17,140,000 |
| 6967169 |
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
William A. Wojtczak, Ma. Fatima Seijo, Long Nguyen |
2005-11-22 |
$14,237,000 |
| 6896826 |
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
William A. Wojtczak, Ma. Fatima Seijo, Long Nguyen |
2005-05-24 |
$15,229,000 |
| 6849200 |
Composition and process for wet stripping removal of sacrificial anti-reflective material |
Thomas H. Baum, David W. Minsek, Melissa Murphy |
2005-02-01 |
$29,010,000 |
| 6800218 |
Abrasive free formulations for chemical mechanical polishing of copper and associated materials and method of using same |
Ying Ma, Michael Jones, Thomas H. Baum, Deepak Verma |
2004-10-05 |
$6,585,000 |
| 6773873 |
pH buffered compositions useful for cleaning residue from semiconductor substrates |
Ma. Fatima Seijo, William A. Wojtczak, Thomas H. Baum, David W. Minsek |
2004-08-10 |
$5,418,000 |
| 6755989 |
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
William A. Wojtczak, Ma. Fatima Seijo, Long Nguyen |
2004-06-29 |
$7,997,000 |
| 6692546 |
Chemical mechanical polishing compositions for metal and associated materials and method of using same |
Ying Ma, William A. Wojtczak, Cary Regulski, Thomas H. Baum, Deepak Verma |
2004-02-17 |
$4,389,000 |