Issued Patents All Time
Showing 1–25 of 99 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12386262 | Resist underlayer film-forming composition using carbon-oxygen double bond | Hikaru TOKUNAGA, Hiroto OGATA, Keisuke Hashimoto | 2025-08-12 |
| 12372875 | Composition for resist pattern metallization process | Wataru SHIBAYAMA, Satoshi Takeda, Shuhei Shigaki, Ken ISHIBASHI, Kodai KATO | 2025-07-29 |
| 12360452 | Resist underlayer film-forming composition | Hikaru TOKUNAGA, Hayato HATTORI | 2025-07-15 |
| 12332566 | Resist underlayer film-forming composition | Hiroto OGATA, Tomotada HIROHARA, Keisuke Hashimoto, Takahiro Kishioka | 2025-06-17 |
| 12313972 | Resist underlayer film-forming composition | Hiroto OGATA, Hirokazu Nishimaki, Yuki MITSUTAKE, Hayato HATTORI | 2025-05-27 |
| 12248251 | Silicon-containing resist underlayer film-forming composition including organic group having ammonium group | Wataru SHIBAYAMA, Hayato HATTORI, Ken ISHIBASHI | 2025-03-11 |
| 12227621 | Film-forming composition | Wataru SHIBAYAMA, Yuichi Goto, Shun KUBODERA, Satoshi Takeda, Ken ISHIBASHI | 2025-02-18 |
| 12084592 | Coating composition for pattern inversion | Hiroaki Yaguchi, Yuki Endo, Wataru SHIBAYAMA, Shuhei Shigaki | 2024-09-10 |
| 12072630 | Resist underlayer film-forming composition including cyclic carbonyl compound | Hikaru TOKUNAGA, Hiroto OGATA, Keisuke Hashimoto | 2024-08-27 |
| 12044969 | Resist underlayer film-forming composition | Hiroto OGATA, Hikaru TOKUNAGA, Hirokazu Nishimaki | 2024-07-23 |
| 11966164 | Semiconductor device production method employing silicon-containing resist underlayer film-forming composition including organic group having ammonium group | Wataru SHIBAYAMA, Hayato HATTORI, Ken ISHIBASHI | 2024-04-23 |
| 11884839 | Acetal-protected silanol group-containing polysiloxane composition | Yuki Endo, Hiroaki Yaguchi | 2024-01-30 |
| 11815815 | Composition for forming silicon-containing resist underlayer film removable by wet process | Hiroyuki Wakayama, Wataru SHIBAYAMA, Masahisa Endo | 2023-11-14 |
| 11674051 | Stepped substrate coating composition containing compound having curable functional group | Hikaru TOKUNAGA, Takafumi Endo, Hiroto OGATA, Keisuke Hashimoto | 2023-06-13 |
| 11609499 | Silicon-containing coating agent for pattern reversal | Shuhei Shigaki, Hiroaki Yaguchi | 2023-03-21 |
| 11574652 | Recording device and recording method | Shin-ichi Ohkoshi, Marie YOSHIKIYO, Kenta Imoto, Kosuke Nakagawa, Asuka Namai +3 more | 2023-02-07 |
| 11561472 | Radiation sensitive composition | Kenji Takase, Satoshi Takeda, Wataru SHIBAYAMA | 2023-01-24 |
| 11531269 | Method for producing resist pattern coating composition with use of solvent replacement method | Shuhei Shigaki, Satoshi Takeda, Wataru SHIBAYAMA, Rikimaru Sakamoto | 2022-12-20 |
| 11488824 | Method for manufacturing semiconductor device using silicon-containing resist underlayer film forming composition for solvent development | Satoshi Takeda, Yuta Kanno, Hiroyuki Wakayama | 2022-11-01 |
| 11392037 | Resist underlayer film forming composition containing silicone having cyclic amino group | Wataru SHIBAYAMA, Yuta Kanno | 2022-07-19 |
| 11315595 | Recording method, recording device, reproduction method, reproduction device, and high-speed response element | Shin-ichi Ohkoshi, Masashi Shirata, Hiroaki Doshita | 2022-04-26 |
| 11284638 | Beverage containing catechin compound(s) and RebD and/or RebM | Yasuyuki Kobayashi | 2022-03-29 |
| 11284630 | Beverage containing tea polymerized polyphenol and RebD and/or RebM | Yasuyuki Kobayashi | 2022-03-29 |
| 11281104 | Alkaline developer soluable silicon-containing resist underlayer film-forming composition | Wataru SHIBAYAMA | 2022-03-22 |
| 11215927 | Substrate treating composition and method for fabricating a semiconductor device using the same | Ju Young Kim, Hyunwoo KIM, Satoshi Takeda, Shuhei Shigaki, Wataru SHIBAYAMA | 2022-01-04 |