Issued Patents All Time
Showing 1–25 of 77 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12405533 | Resist underlayer film-forming composition containing substituted crosslinkable compound | Keisuke Hashimoto, Kenji Takase, Tetsuya Shinjo, Rikimaru Sakamoto, Hirokazu Nishimaki | 2025-09-02 |
| 12366804 | Composition containing a heterocyclic compound having a dicyanostyryl group, for forming a resist underlayer film capable of being wet etched | Yuki Endo | 2025-07-22 |
| 12344758 | Chemical solution-resistant protective film forming composition containing polymerization product having diol structure at terminal thereof | Tokio NISHITA | 2025-07-01 |
| 12331156 | Chemical-resistant protective film forming composition containing hydroxyaryl-terminated polymer | Shigetaka OTAGIRI, Tokio NISHITA, Yuki Endo, Takahiro Kishioka | 2025-06-17 |
| 12242194 | Resist underlayer film-forming composition comprising epoxy adduct having long-chain alkyl group | Daigo Saito, Ryo Karasawa, Rikimaru Sakamoto | 2025-03-04 |
| 12222651 | Resist underlayer film forming composition having a disulfide structure | Yuichi Goto, Yasunobu Someya, Ryuta MIZUOCHI, Satoshi KAMIBAYASHI | 2025-02-11 |
| 12147158 | Photocurable composition and method for producing semiconductor device | Hikaru TOKUNAGA, Keisuke Hashimoto, Rikimaru Sakamoto | 2024-11-19 |
| 12077633 | Chemical-resistant protective film-forming composition containing polymerization product of arylene compound having glycidyl group | Tokio NISHITA, Ryuta MIZUOCHI | 2024-09-03 |
| 12072629 | Resist underlayer film-forming composition containing novolac resin to which aromatic vinyl compound is added | Keisuke Hashimoto, Hirokazu Nishimaki, Rikimaru Sakamoto | 2024-08-27 |
| 12044968 | Protective film-forming composition having acetal structure and amide structure | Tokio NISHITA, Yuki Endo, Takahiro Kishioka | 2024-07-23 |
| 11977331 | Composition containing a dicyanostyryl group, for forming a resist underlayer film capable of being wet etched | Yuki Endo | 2024-05-07 |
| 11965059 | Chemical-resistant protective film forming composition containing hydroxyaryl-terminated polymer | Shigetaka OTAGIRI, Tokio NISHITA, Yuki Endo, Takahiro Kishioka | 2024-04-23 |
| 11768436 | Protective film forming composition having a diol structure | Yasunobu Someya, Takahiro Kishioka | 2023-09-26 |
| 11681223 | Photocurable composition and method for producing semiconductor device | Hikaru TOKUNAGA, Keisuke Hashimoto, Rikimaru Sakamoto | 2023-06-20 |
| 11675269 | Composition for forming resist overlayer film for EUV lithography | Rikimaru Sakamoto, Bangching Ho | 2023-06-13 |
| 11674053 | Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structure | Yasunobu Someya, Hiroyuki Wakayama, Rikimaru Sakamoto | 2023-06-13 |
| 11674051 | Stepped substrate coating composition containing compound having curable functional group | Hikaru TOKUNAGA, Hiroto OGATA, Keisuke Hashimoto, Makoto Nakajima | 2023-06-13 |
| 11650505 | Resist underlayer film-forming composition containing novolac resin reacted with aromatic methylol compound | Hirokazu Nishimaki, Rikimaru Sakamoto, Keisuke Hashimoto | 2023-05-16 |
| 11460771 | Protective film forming composition having an acetal structure | Yasunobu Someya, Takahiro Kishioka | 2022-10-04 |
| 11454889 | Crosslinkable compound-containing photocurable stepped substrate-coating composition | Hikaru TOKUNAGA | 2022-09-27 |
| 11414141 | Structure for attaching undercover to vehicle body | Katsuhisa Endoh | 2022-08-16 |
| 11385546 | Multi-level substrate coating film-forming composition containing plasma-curable compound based on unsaturated bonds between carbon atoms | Hikaru TOKUNAGA, Keisuke Hashimoto, Rikimaru Sakamoto | 2022-07-12 |
| 11287742 | Composition for forming resist underlayer film having improved flattening properties | Hirokazu Nishimaki | 2022-03-29 |
| 11199777 | Resist underlayer film-forming composition containing novolac polymer having secondary amino group | Hirokazu Nishimaki, Keisuke Hashimoto, Rikimaru Sakamoto | 2021-12-14 |
| 11194251 | Resist underlayer film-forming composition for lithography containing polymer having blocked isocyanate structure | Ryo Karasawa, Tokio NISHITA, Yasunobu Someya, Rikimaru Sakamoto | 2021-12-07 |