Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11675269 | Composition for forming resist overlayer film for EUV lithography | Rikimaru Sakamoto, Takafumi Endo | 2023-06-13 |
| 11130855 | Composition for forming release layer, and release layer | Kazuya Shindo, Tokio NISHITA, Kazuya Ebara | 2021-09-28 |
| 10437150 | Composition for forming resist underlayer film with reduced outgassing | Rikimaru Sakamoto, Takafumi Endo | 2019-10-08 |
| 9753369 | Polymer-containing developer | Rikimaru Sakamoto, Yasushi Sakaida | 2017-09-05 |
| 9627217 | Silicon-containing EUV resist underlayer film-forming composition including additive | Shuhei Shigaki, Hiroaki Yaguchi, Wataru SHIBAYAMA, Rikimaru Sakamoto | 2017-04-18 |
| 9494864 | Resist overlayer film forming composition for lithography and method for manufacturing semiconductor device using the same | Ryuji Ohnishi, Rikimaru Sakamoto | 2016-11-15 |
| 9240327 | Resist underlayer film-forming composition for EUV lithography containing condensation polymer | Rikimaru Sakamoto, Noriaki Fujitani, Takafumi Endo, Ryuji Ohnishi | 2016-01-19 |
| 9005873 | Composition for forming resist underlayer film for EUV lithography | Rikimaru Sakamoto, Takafumi Endo | 2015-04-14 |
| 8722840 | Resist underlayer film forming composition, and method for forming resist pattern using the same | Rikimaru Sakamoto, Noriaki Fujitani, Takafumi Endo, Ryuji Ohnishi | 2014-05-13 |