Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12372875 | Composition for resist pattern metallization process | Wataru SHIBAYAMA, Satoshi Takeda, Ken ISHIBASHI, Kodai KATO, Makoto Nakajima | 2025-07-29 |
| 12084592 | Coating composition for pattern inversion | Hiroaki Yaguchi, Makoto Nakajima, Yuki Endo, Wataru SHIBAYAMA | 2024-09-10 |
| 11609499 | Silicon-containing coating agent for pattern reversal | Hiroaki Yaguchi, Makoto Nakajima | 2023-03-21 |
| 11531269 | Method for producing resist pattern coating composition with use of solvent replacement method | Satoshi Takeda, Wataru SHIBAYAMA, Makoto Nakajima, Rikimaru Sakamoto | 2022-12-20 |
| 11479627 | Film forming composition containing fluorine-containing surfactant | Makiko Umezaki, Ryo Karasawa, Ryuta MIZUOCHI | 2022-10-25 |
| 11459414 | Film forming composition containing fluorine-containing surfactant | Makiko Umezaki, Ryo Karasawa, Ryuta MIZUOCHI | 2022-10-04 |
| 11215927 | Substrate treating composition and method for fabricating a semiconductor device using the same | Ju Young Kim, Hyunwoo KIM, Makoto Nakajima, Satoshi Takeda, Wataru SHIBAYAMA | 2022-01-04 |
| 10910220 | Planarization method for a semiconductor substrate using a silicon-containing composition | Hiroaki Yaguchi, Makoto Nakajima | 2021-02-02 |
| 10613440 | Silicon-containing EUV resist underlayer film-forming composition containing onium sulfonate | Wataru SHIBAYAMA, Rikimaru Sakamoto | 2020-04-07 |
| 10558119 | Composition for coating resist pattern | Wataru SHIBAYAMA, Makoto Nakajima, Hiroaki Yaguchi, Rikimaru Sakamoto | 2020-02-11 |
| 10508174 | Silicon-containing coating agent for reversing planarization pattern | Hiroaki Yaguchi, Makoto Nakajima | 2019-12-17 |
| 10133178 | Coating liquid for resist pattern coating | Tokio NISHITA, Noriaki Fujitani, Takafumi Endo, Rikimaru Sakamoto | 2018-11-20 |
| 10082735 | Silicon-containing resist underlayer film-forming composition having organic group having aliphatic polycyclic structure | Wataru SHIBAYAMA, Makoto Nakajima, Satoshi Takeda, Hiroyuki Wakayama, Rikimaru Sakamoto | 2018-09-25 |
| 10025191 | Polymer-containing coating liquid applied to resist pattern | Yasushi Sakaida, Rikimaru Sakamoto | 2018-07-17 |
| 9834745 | Cleaning fluid for semiconductor, and cleaning method using the same | Suguru Sassa | 2017-12-05 |
| 9695462 | Method for evaluation of drug efficacy of a medicine having a therapeutic or preventive effect against a disease related to EL activity and a method for screening an inhibitor of EL activity | Takashi Ono, Atsuko Yamamoto | 2017-07-04 |
| 9632414 | Coating liquid to be applied to resist pattern and method for forming reverse pattern | Yasushi Sakaida, Rikimaru Sakamoto | 2017-04-25 |
| 9627217 | Silicon-containing EUV resist underlayer film-forming composition including additive | Hiroaki Yaguchi, Wataru SHIBAYAMA, Rikimaru Sakamoto, Bangching Ho | 2017-04-18 |
| 9337052 | Silicon-containing EUV resist underlayer film forming composition | Hiroaki Yaguchi, Rikimaru Sakamoto, Bang-Ching Ho | 2016-05-10 |
| 9290623 | Composition for forming silicon-containing resist underlayer film having cyclic diester group | Yuta Kanno, Daisuke SAKUMA, Kenji Takase, Makoto Nakajima | 2016-03-22 |
| 9093279 | Thin film forming composition for lithography containing titanium and silicon | Makoto Nakajima, Yuta Kanno, Satoshi Takeda, Yasushi Sakaida | 2015-07-28 |