Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9337052 | Silicon-containing EUV resist underlayer film forming composition | Shuhei Shigaki, Hiroaki Yaguchi, Rikimaru Sakamoto | 2016-05-10 |
| 7948096 | Semiconductor using specific contact angle for immersion lithography | Jen-Chieh Shih | 2011-05-24 |
| 7751025 | Scatterometric method of monitoring hot plate temperature and facilitating critical dimension control | Li-Jui Chen, Chih-Ming Ke, Jen-Chieh Shih, Tsai-Sheng Gau | 2010-07-06 |
| 7611825 | Photolithography method to prevent photoresist pattern collapse | Ching-Yu Chang, Kuei-Shun Chen | 2009-11-03 |
| 7452822 | Via plug formation in dual damascene process | Jen-Chieh Shih, Jian-Hong Chen | 2008-11-18 |
| 7279793 | System and method for manufacturing semiconductor devices using an anti-reflective coating layer | Jen-Chieh Shih | 2007-10-09 |
| 7196005 | Dual damascene process with dummy features | — | 2007-03-27 |
| 7135259 | Scatterometric method of monitoring hot plate temperature and facilitating critical dimension control | Li-Jui Chen, Chih-Ming Ke, Jen-Chieh Shih, Tsai-Sheng Gau | 2006-11-14 |
| 7119035 | Method using specific contact angle for immersion lithography | Jen-Chieh Shih | 2006-10-10 |
| 6982135 | Pattern compensation for stitching | Chung-Hsing Chang, Chien-Hung Lin, Burn Jeng Lin, Chia-Hui Lin, Chih-Cheng Chin +3 more | 2006-01-03 |