Issued Patents All Time
Showing 1–25 of 100 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12405533 | Resist underlayer film-forming composition containing substituted crosslinkable compound | Keisuke Hashimoto, Kenji Takase, Tetsuya Shinjo, Takafumi Endo, Hirokazu Nishimaki | 2025-09-02 |
| 12242196 | Resist underlayer film-forming composition containing indolocarbazole novolak resin | Hikaru TOKUNAGA, Daigo Saito, Keisuke Hashimoto | 2025-03-04 |
| 12242194 | Resist underlayer film-forming composition comprising epoxy adduct having long-chain alkyl group | Takafumi Endo, Daigo Saito, Ryo Karasawa | 2025-03-04 |
| 12147158 | Photocurable composition and method for producing semiconductor device | Hikaru TOKUNAGA, Takafumi Endo, Keisuke Hashimoto | 2024-11-19 |
| 12087576 | Composition for forming coating film and method for manufacturing semiconductor device | Tokio NISHITA, Yasunobu Someya, Takahiro Kishioka | 2024-09-10 |
| 12072629 | Resist underlayer film-forming composition containing novolac resin to which aromatic vinyl compound is added | Takafumi Endo, Keisuke Hashimoto, Hirokazu Nishimaki | 2024-08-27 |
| 12025915 | Resist underlayer film-forming composition comprising polymer having structural unit having urea linkage | Tokio NISHITA, Yuichi Goto, Gun SON | 2024-07-02 |
| 11798810 | Resist underlayer film-forming composition containing amide solvent | Hikaru TOKUNAGA, Satoshi Hamada, Keisuke Hashimoto | 2023-10-24 |
| 11720024 | Resist underlayer film-forming composition containing indolocarbazole novolak resin | Hikaru TOKUNAGA, Daigo Saito, Keisuke Hashimoto | 2023-08-08 |
| 11681223 | Photocurable composition and method for producing semiconductor device | Hikaru TOKUNAGA, Takafumi Endo, Keisuke Hashimoto | 2023-06-20 |
| 11675270 | Resist underlayer film-forming composition | Tokio NISHITA | 2023-06-13 |
| 11675269 | Composition for forming resist overlayer film for EUV lithography | Bangching Ho, Takafumi Endo | 2023-06-13 |
| 11674053 | Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structure | Takafumi Endo, Yasunobu Someya, Hiroyuki Wakayama | 2023-06-13 |
| 11650505 | Resist underlayer film-forming composition containing novolac resin reacted with aromatic methylol compound | Hirokazu Nishimaki, Keisuke Hashimoto, Takafumi Endo | 2023-05-16 |
| 11592747 | Resist underlayer film-forming composition comprising carbonyl-containing polyhydroxy aromatic ring novolac resin | Yasunobu Someya, Ryo Karasawa, Keisuke Hashimoto, Tetsuya Shinjo | 2023-02-28 |
| 11531269 | Method for producing resist pattern coating composition with use of solvent replacement method | Shuhei Shigaki, Satoshi Takeda, Wataru SHIBAYAMA, Makoto Nakajima | 2022-12-20 |
| 11506980 | Resist underlayer film forming composition using a fluorene compound | Hikaru TOKUNAGA, Keisuke Hashimoto | 2022-11-22 |
| 11440985 | Underlayer film-forming composition for use in forming a microphase-separated pattern | Ryuta MIZUOCHI, Yasunobu Someya, Hiroyuki Wakayama | 2022-09-13 |
| 11385546 | Multi-level substrate coating film-forming composition containing plasma-curable compound based on unsaturated bonds between carbon atoms | Takafumi Endo, Hikaru TOKUNAGA, Keisuke Hashimoto | 2022-07-12 |
| 11372330 | Anti-reflective coating forming composition containing reaction product of isocyanuric acid compound with benzoic acid compound | Takahiro Kishioka, Daisuke Maruyama | 2022-06-28 |
| 11300879 | Resist underlayer film forming composition containing triaryldiamine-containing novolac resin | Daigo Saito, Keisuke Hashimoto | 2022-04-12 |
| 11199777 | Resist underlayer film-forming composition containing novolac polymer having secondary amino group | Hirokazu Nishimaki, Keisuke Hashimoto, Takafumi Endo | 2021-12-14 |
| 11194251 | Resist underlayer film-forming composition for lithography containing polymer having blocked isocyanate structure | Ryo Karasawa, Tokio NISHITA, Yasunobu Someya, Takafumi Endo | 2021-12-07 |
| 11169441 | Composition for forming resist underlayer film, resist underlayer film, method for forming resist pattern and method for producing semiconductor device | Daigo Saito, Keisuke Hashimoto | 2021-11-09 |
| 11155684 | Photocrosslinkable group-containing composition for coating stepped substrate | Takafumi Endo, Tadashi Hatanaka | 2021-10-26 |