Issued Patents All Time
Showing 26–50 of 100 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11022884 | Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group | Wataru SHIBAYAMA, Kenji Takase, Makoto Nakajima, Satoshi Takeda, Hiroyuki Wakayama | 2021-06-01 |
| 11009795 | Aqueous solution for resist pattern coating and pattern forming methods using the same | Tokio NISHITA | 2021-05-18 |
| 10995172 | Self-organized film-forming composition for use in forming a micro-phase-separated pattern | Ryuta MIZUOCHI, Yasunobu Someya, Hiroyuki Wakayama | 2021-05-04 |
| 10894887 | Composition for forming film protecting against aqueous hydrogen peroxide solution | Hikaru TOKUNAGA, Yuto HASHIMOTO, Keisuke Hashimoto | 2021-01-19 |
| 10871712 | Stepped substrate-coating composition containing polyether resin having photocrosslinkable group | Hikaru TOKUNAGA, Takafumi Endo, Keisuke Hashimoto | 2020-12-22 |
| 10865262 | Upper-layer film forming composition and method for producing a phase-separated pattern | Ryuta MIZUOCHI, Yasunobu Someya, Hiroyuki Wakayama | 2020-12-15 |
| 10838303 | Resist underlayer film forming composition for lithography containing hydrolyzable silane having carbonate skeleton | Wataru SHIBAYAMA, Makoto Nakajima, Yuichi Goto | 2020-11-17 |
| 10809619 | Resist underlayer film-forming composition containing substituted crosslinkable compound | Keisuke Hashimoto, Kenji Takase, Tetsuya Shinjo, Takafumi Endo, Hirokazu Nishimaki | 2020-10-20 |
| 10804111 | Method for roughening surface using wet treatment | Keisuke Hashimoto, Yasunobu Someya, Takahiro Kishioka | 2020-10-13 |
| 10795261 | Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same | Tokio NISHITA | 2020-10-06 |
| 10684546 | Composition for forming resist underlayer film | Yasushi Sakaida, Kenji Takase, Takahiro Kishioka | 2020-06-16 |
| 10613435 | Coating solution for resist pattern coating and method for forming pattern | Tokio NISHITA | 2020-04-07 |
| 10613440 | Silicon-containing EUV resist underlayer film-forming composition containing onium sulfonate | Wataru SHIBAYAMA, Shuhei Shigaki | 2020-04-07 |
| 10585353 | Resist underlayer film forming composition | Hirokazu Nishimaki, Keisuke Hashimoto | 2020-03-10 |
| 10558119 | Composition for coating resist pattern | Wataru SHIBAYAMA, Makoto Nakajima, Shuhei Shigaki, Hiroaki Yaguchi | 2020-02-11 |
| 10508181 | Bottom layer film-formation composition of self-organizing film containing polycyclic organic vinyl compound | Yasunobu Someya, Hiroyuki Wakayama, Takafumi Endo | 2019-12-17 |
| 10437150 | Composition for forming resist underlayer film with reduced outgassing | Bangching Ho, Takafumi Endo | 2019-10-08 |
| 10394124 | Resist underlayer film-forming composition containing polymer having arylene group | Keisuke Hashimoto, Hirokazu Nishimaki, Takafumi Endo | 2019-08-27 |
| 10372040 | Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide group | Wataru SHIBAYAMA, Kenji Takase | 2019-08-06 |
| 10295907 | Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure | Ryo Karasawa, Yasunobu Someya, Takafumi Endo, Tokio NISHITA | 2019-05-21 |
| 10289002 | Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer | Yasushi Sakaida, Ryuta MIZUOCHI | 2019-05-14 |
| 10280328 | Bottom layer film-forming composition of self-organizing film containing styrene structure | Yasunobu Someya, Hiroyuki Wakayama, Takafumi Endo | 2019-05-07 |
| 10242871 | Resist underlayer film-forming composition including a compound having an amino group protected with a tert-butoxycarbonyl group | Tokio NISHITA, Noriaki Fujitani | 2019-03-26 |
| 10191374 | Resist underlayer film-forming composition | Hirokazu Nishimaki, Keisuke Hashimoto, Takafumi Endo | 2019-01-29 |
| 10139729 | Coating composition for pattern reversal on soc pattern | Hiroaki Yaguchi, Makoto Nakajima, Wataru SHIBAYAMA, Satoshi Takeda, Hiroyuki Wakayama | 2018-11-27 |