Issued Patents All Time
Showing 51–75 of 100 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10133178 | Coating liquid for resist pattern coating | Tokio NISHITA, Shuhei Shigaki, Noriaki Fujitani, Takafumi Endo | 2018-11-20 |
| 10113083 | Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound | Ryuji Ohnishi, Ryuta MIZUOCHI, Tokio NISHITA, Yasushi Sakaida | 2018-10-30 |
| 10082735 | Silicon-containing resist underlayer film-forming composition having organic group having aliphatic polycyclic structure | Wataru SHIBAYAMA, Shuhei Shigaki, Makoto Nakajima, Satoshi Takeda, Hiroyuki Wakayama | 2018-09-25 |
| 10067423 | Additive and resist underlayer film-forming composition containing the same | Yuto HASHIMOTO, Yasushi Sakaida, Kenji Takase | 2018-09-04 |
| 10042258 | Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition | Noriaki Fujitani, Takafumi Endo | 2018-08-07 |
| 10042247 | Mask blank, method for manufacturing mask blank and transfer mask | Takahiro Hiromatsu, Masahiro Hashimoto, Yasushi Sakaida, Ryuta MIZUOCHI, Masaki Nagai | 2018-08-07 |
| 10025191 | Polymer-containing coating liquid applied to resist pattern | Shuhei Shigaki, Yasushi Sakaida | 2018-07-17 |
| 10017664 | Novolac resin-containing resist underlayer film-forming composition using bisphenol aldehyde | Takafumi Endo, Keisuke Hashimoto, Hirokazu Nishimaki | 2018-07-10 |
| 10000664 | Underlayer film-forming composition for self-assembled films | Hiroyuki Wakayama, Makoto Nakajima | 2018-06-19 |
| 9977331 | Resist overlayer film forming composition and method for producing semiconductor device including the same | Noriaki Fujitani | 2018-05-22 |
| 9927705 | Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same | Noriaki Fujitani, Takafumi Endo, Ryuji Ohnishi | 2018-03-27 |
| 9910354 | Resist underlayer film-forming composition and method for forming resist pattern using the same | Yasushi Sakaida, Tokio NISHITA, Noriaki Fujitani | 2018-03-06 |
| 9761741 | Film-forming material | Kazuya Ebara, Hikaru Imamura | 2017-09-12 |
| 9753369 | Polymer-containing developer | Yasushi Sakaida, Bangching Ho | 2017-09-05 |
| 9746764 | Mask blank and transfer mask | Takahiro Hiromatsu, Masahiro Hashimoto, Yasushi Sakaida, Ryuta MIZUOCHI, Masaki Nagai | 2017-08-29 |
| 9746768 | Resist overlayer film forming composition for lithography and method for producing semiconductor device using the same | Ryuji Ohnishi, Noriaki Fujitani | 2017-08-29 |
| 9632414 | Coating liquid to be applied to resist pattern and method for forming reverse pattern | Yasushi Sakaida, Shuhei Shigaki | 2017-04-25 |
| 9627217 | Silicon-containing EUV resist underlayer film-forming composition including additive | Shuhei Shigaki, Hiroaki Yaguchi, Wataru SHIBAYAMA, Bangching Ho | 2017-04-18 |
| 9494864 | Resist overlayer film forming composition for lithography and method for manufacturing semiconductor device using the same | Ryuji Ohnishi, Bangching Ho | 2016-11-15 |
| 9469777 | Resist underlayer film forming composition that contains novolac resin having polynuclear phenol | Takafumi Endo, Tetsuya Shinjo, Keisuke Hashimoto, Yasunobu Someya, Hirokazu Nishimaki +1 more | 2016-10-18 |
| 9448480 | Resist underlayer film formation composition and method for forming resist pattern using the same | Tokio NISHITA, Ryuji Ohnishi, Noriaki Fujitani | 2016-09-20 |
| 9394231 | Composition for forming antistatic film and oligomer compound | Tokio NISHITA, Ryuta MIZUOCHI, Tomohisa Yamada, Naoki Nakaie, Yuki TAKAYAMA | 2016-07-19 |
| 9395628 | Resist underlayer film-forming composition containing aryl sulfonate salt having hydroxyl group | Takafumi Endo, Keisuke Hashimoto, Hirokazu Nishimaki | 2016-07-19 |
| 9384977 | Method of manufacturing semiconductor device using organic underlayer film forming composition for solvent development lithography process | Yasunobu Someya, Satoshi Takeda, Keisuke Hashimoto, Tetsuya Shinjo | 2016-07-05 |
| 9337052 | Silicon-containing EUV resist underlayer film forming composition | Shuhei Shigaki, Hiroaki Yaguchi, Bang-Ching Ho | 2016-05-10 |