Issued Patents All Time
Showing 1–25 of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12222651 | Resist underlayer film forming composition having a disulfide structure | Takafumi Endo, Yuichi Goto, Ryuta MIZUOCHI, Satoshi KAMIBAYASHI | 2025-02-11 |
| 12087576 | Composition for forming coating film and method for manufacturing semiconductor device | Tokio NISHITA, Rikimaru Sakamoto, Takahiro Kishioka | 2024-09-10 |
| 12072631 | Resist underlayer film-forming composition and method for forming resist pattern using the same | Shou SHIMIZU, Ryuta MIZUOCHI, Hiroyuki Wakayama | 2024-08-27 |
| 12030974 | Composition for forming block copolymer layer for formation of microphase-separated pattern | Ryuta MIZUOCHI, Hiroyuki Wakayama, Masami Kozawa, Shinsuke TADOKORO | 2024-07-09 |
| 11768436 | Protective film forming composition having a diol structure | Takafumi Endo, Takahiro Kishioka | 2023-09-26 |
| 11674053 | Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structure | Takafumi Endo, Hiroyuki Wakayama, Rikimaru Sakamoto | 2023-06-13 |
| 11592747 | Resist underlayer film-forming composition comprising carbonyl-containing polyhydroxy aromatic ring novolac resin | Ryo Karasawa, Keisuke Hashimoto, Tetsuya Shinjo, Rikimaru Sakamoto | 2023-02-28 |
| 11460771 | Protective film forming composition having an acetal structure | Takafumi Endo, Takahiro Kishioka | 2022-10-04 |
| 11440985 | Underlayer film-forming composition for use in forming a microphase-separated pattern | Ryuta MIZUOCHI, Hiroyuki Wakayama, Rikimaru Sakamoto | 2022-09-13 |
| 11339242 | Method for manufacturing semiconductor substrate having group-III nitride compound layer | Keisuke Hashimoto, Masaru Hori, Makoto Sekine | 2022-05-24 |
| 11194251 | Resist underlayer film-forming composition for lithography containing polymer having blocked isocyanate structure | Ryo Karasawa, Tokio NISHITA, Takafumi Endo, Rikimaru Sakamoto | 2021-12-07 |
| 10995172 | Self-organized film-forming composition for use in forming a micro-phase-separated pattern | Ryuta MIZUOCHI, Hiroyuki Wakayama, Rikimaru Sakamoto | 2021-05-04 |
| 10865262 | Upper-layer film forming composition and method for producing a phase-separated pattern | Ryuta MIZUOCHI, Hiroyuki Wakayama, Rikimaru Sakamoto | 2020-12-15 |
| 10804111 | Method for roughening surface using wet treatment | Keisuke Hashimoto, Takahiro Kishioka, Rikimaru Sakamoto | 2020-10-13 |
| 10508181 | Bottom layer film-formation composition of self-organizing film containing polycyclic organic vinyl compound | Hiroyuki Wakayama, Takafumi Endo, Rikimaru Sakamoto | 2019-12-17 |
| 10295907 | Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure | Ryo Karasawa, Takafumi Endo, Tokio NISHITA, Rikimaru Sakamoto | 2019-05-21 |
| 10280328 | Bottom layer film-forming composition of self-organizing film containing styrene structure | Hiroyuki Wakayama, Takafumi Endo, Rikimaru Sakamoto | 2019-05-07 |
| 9746772 | Resist underlayer film forming composition for lithography containing polyether structure-containing resin | Hiroaki Okuyama, Masakazu Kato, Tetsuya Shinjo, Keisuke Hashimoto | 2017-08-29 |
| 9514949 | Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure | Yuki Usui, Masakazu Kato, Tetsuya Shinjo, Keisuke Hashimoto, Ryo Karasawa | 2016-12-06 |
| 9469777 | Resist underlayer film forming composition that contains novolac resin having polynuclear phenol | Takafumi Endo, Tetsuya Shinjo, Keisuke Hashimoto, Hirokazu Nishimaki, Ryo Karasawa +1 more | 2016-10-18 |
| 9384977 | Method of manufacturing semiconductor device using organic underlayer film forming composition for solvent development lithography process | Satoshi Takeda, Keisuke Hashimoto, Tetsuya Shinjo, Rikimaru Sakamoto | 2016-07-05 |
| 9343324 | Resist underlayer film-forming composition which contains alicyclic skeleton-containing carbazole resin | Tetsuya Shinjo, Keisuke Hashimoto, Ryo Karasawa | 2016-05-17 |
| 9263285 | Composition for forming a resist underlayer film including hydroxyl group-containing carbazole novolac resin | Tetsuya Shinjo, Hiroaki Okuyama, Keisuke Hashimoto, Ryo Karasawa, Masakazu Kato | 2016-02-16 |
| 9261790 | Resist underlayer film-forming composition containing copolymer resin having heterocyclic ring | Keisuke Hashimoto, Tetsuya Shinjo, Hirokazu Nishimaki, Ryo Karasawa, Rikimaru Sakamoto | 2016-02-16 |
| 9263286 | Diarylamine novolac resin | Rikimaru Sakamoto, Keisuke Hashimoto, Hirokazu Nishimaki | 2016-02-16 |