YU

Yuki Usui

NI Nissan Chemical Industries: 15 patents #98 of 1,150Top 9%
FH Fuji Oil Holdings: 1 patents #159 of 368Top 45%
SU Shinshu University: 1 patents #77 of 261Top 30%
UT University Of Toyama: 1 patents #3 of 28Top 15%
📍 Toyama, JP: #174 of 1,699 inventorsTop 15%
Overall (All Time): #269,529 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDate
11655273 Substrates coated with selective cell separation or cell culture polymers Hiromi Kitano, Tadashi Nakaji, Taito Nishino, Takahiro Kishioka 2023-05-23
11542366 Composition for forming resist underlayer film and method for forming resist pattern using same Hiroto OGATA, Mamoru TAMURA, Takahiro Kishioka 2023-01-03
11319514 Composition for forming a coating film for removing foreign matters Takahiro Kishioka, Mamoru TAMURA, Hiroto OGATA 2022-05-03
11131928 Resist underlayer film forming composition which contains compound having glycoluril skeleton as additive Takahiro Kishioka, Yasushi Sakaida, Hiroto OGATA 2021-09-28
11003078 Compositions for forming a protective film against basic aqueous hydrogen peroxide solution, and pattern formation method Tomoya Ohashi, Hiroto OGATA, Yuto HASHIMOTO, Yasushi Sakaida, Takahiro Kishioka 2021-05-11
10844167 Composition for forming resist underlayer film and method for forming resist pattern using same Hiroto OGATA, Mamoru TAMURA, Takahiro Kishioka 2020-11-24
10437151 Cationically polymerizable resist underlayer film-forming composition Hiroto OGATA, Shigeo Kimura, Tomoya Ohashi, Takahiro Kishioka 2019-10-08
9822330 Light-degradable material, substrate, and method for patterning the substrate Takahiro Kishioka, Shigeo Kimura, Yoshiomi Hiroi, Hiromi Kitano, Tadashi Nakaji +1 more 2017-11-21
9793131 Pattern forming method using resist underlayer film Tomoya Ohashi, Shigeo Kimura, Hiroto OGATA 2017-10-17
9678427 Resist underlayer film-forming composition containing copolymer that has triazine ring and sulfur atom in main chain Hiroto OGATA, Takahiro Kishioka, Yoshiomi Hiroi, Tomoya Ohashi 2017-06-13
9514949 Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure Yasunobu Someya, Masakazu Kato, Tetsuya Shinjo, Keisuke Hashimoto, Ryo Karasawa 2016-12-06
9340561 Organic silicon compound and silane coupling agent containing the same Makiko Umezaki, Daisuke SAKUMA, Taito Nishino, Takahiro Kishioka, Yoshiomi Hiroi +2 more 2016-05-17
9320602 Compressed fiber structural material and method for producing the same Noboru Nakayama, Masaomi Horita, Naoki Izawa, Hiroto Tamai, Naoto Saito +1 more 2016-04-26
9140989 Photosensitive organic particles Takahiro Kishioka, Makiko Umezaki, Shigeo Kimura, Hirokazu Nishimaki, Tomoya Ohashi 2015-09-22
9101158 Application of soybean emulsion composition to soybean-derived raw material-containing food or beverage Masahiko Samoto, Jiro Kanamori, Norifumi Adachi, Chizuru Ueno, Eriko Harada +14 more 2015-08-11
9023583 Monolayer or multilayer forming composition Takahiro Kishioka, Daisuke SAKUMA, Shigeo Kimura, Hirokazu Nishimaki, Tomoya Ohashi 2015-05-05
8685615 Photosensitive resist underlayer film forming composition Shigeo Kimura, Hirokazu Nishimaki, Tomoya Ohashi, Takahiro Kishioka 2014-04-01