YS

Yasushi Sakaida

NI Nissan Chemical Industries: 25 patents #29 of 1,150Top 3%
HO Hoya: 2 patents #523 of 1,290Top 45%
📍 Toyama, JP: #115 of 1,699 inventorsTop 7%
Overall (All Time): #162,899 of 4,157,543Top 4%
25
Patents All Time

Issued Patents All Time

Showing 1–25 of 25 patents

Patent #TitleCo-InventorsDate
11131928 Resist underlayer film forming composition which contains compound having glycoluril skeleton as additive Yuki Usui, Takahiro Kishioka, Hiroto OGATA 2021-09-28
11112696 Protective film-forming composition Yuto HASHIMOTO, Hikaru TOKUNAGA, Hiroto OGATA, Tomoya Ohashi, Takahiro Kishioka 2021-09-07
11003078 Compositions for forming a protective film against basic aqueous hydrogen peroxide solution, and pattern formation method Tomoya Ohashi, Hiroto OGATA, Yuto HASHIMOTO, Yuki Usui, Takahiro Kishioka 2021-05-11
10684546 Composition for forming resist underlayer film Kenji Takase, Takahiro Kishioka, Rikimaru Sakamoto 2020-06-16
10509320 Underlying coating forming composition for lithography containing compound having protected carboxyl group Satoshi Takei, Tetsuya Shinjo, Keisuke Hashimoto 2019-12-17
10289002 Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer Ryuta MIZUOCHI, Rikimaru Sakamoto 2019-05-14
10113083 Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound Ryuji Ohnishi, Ryuta MIZUOCHI, Tokio NISHITA, Rikimaru Sakamoto 2018-10-30
10067423 Additive and resist underlayer film-forming composition containing the same Yuto HASHIMOTO, Kenji Takase, Rikimaru Sakamoto 2018-09-04
10042247 Mask blank, method for manufacturing mask blank and transfer mask Takahiro Hiromatsu, Masahiro Hashimoto, Ryuta MIZUOCHI, Rikimaru Sakamoto, Masaki Nagai 2018-08-07
10025191 Polymer-containing coating liquid applied to resist pattern Shuhei Shigaki, Rikimaru Sakamoto 2018-07-17
9910354 Resist underlayer film-forming composition and method for forming resist pattern using the same Tokio NISHITA, Noriaki Fujitani, Rikimaru Sakamoto 2018-03-06
9753369 Polymer-containing developer Rikimaru Sakamoto, Bangching Ho 2017-09-05
9746764 Mask blank and transfer mask Takahiro Hiromatsu, Masahiro Hashimoto, Ryuta MIZUOCHI, Rikimaru Sakamoto, Masaki Nagai 2017-08-29
9632414 Coating liquid to be applied to resist pattern and method for forming reverse pattern Rikimaru Sakamoto, Shuhei Shigaki 2017-04-25
9165781 Composition for forming pattern reversal film and method for forming reversal pattern Hiroaki Yaguchi 2015-10-20
9093279 Thin film forming composition for lithography containing titanium and silicon Makoto Nakajima, Yuta Kanno, Satoshi Takeda, Shuhei Shigaki 2015-07-28
8916327 Underlayer coating forming composition containing dextrin ester compound Satoshi Takei, Tetsuya Shinjo 2014-12-23
8822138 Composition for forming resist underlayer film for lithography including resin containing alicyclic ring and aromatic ring Tetsuya Shinjo, Hirokazu Nishimaki, Keisuke Hashimoto 2014-09-02
8658341 Pattern reversal film forming composition and method of forming reversed pattern Daisuke Maruyama, Hiroaki Yaguchi 2014-02-25
8283103 Composition for forming resist underlayer film for lithography and production method of semiconductor device Hikaru Imamura, Makoto Nakajima, Satoshi Takei 2012-10-09
8007979 Acrylic polymer-containing gap fill material forming composition for lithography Satoshi Takei, Kazuhisa Ishii, Takahiro Kishioka 2011-08-30
7842620 Method for manufacturing semiconductor device using quadruple-layer laminate Satoshi Takei, Makoto Nakajima, Hikaru Imamura, Keisuke Hashimoto, Takahiro Kishioka 2010-11-30
7727902 Composition for forming nitride coating film for hard mask Satoshi Takei 2010-06-01
7365023 Porous underlayer coating and underlayer coating forming composition for forming porous underlayer coating Satoshi Takei 2008-04-29
7226721 Underlayer coating forming composition for lithography containing compound having protected carboxyl group Satoshi Takei, Takahiro Kishioka, Tetsuya Shinjo 2007-06-05