Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10509320 | Underlying coating forming composition for lithography containing compound having protected carboxyl group | Tetsuya Shinjo, Keisuke Hashimoto, Yasushi Sakaida | 2019-12-17 |
| 9946158 | Composition for forming resist underlayer film for nanoimprint | Tomoya Ohashi | 2018-04-17 |
| 9134610 | Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating | Tetsuya Shinjo, Motohiko Hidaka | 2015-09-15 |
| 8916327 | Underlayer coating forming composition containing dextrin ester compound | Yasushi Sakaida, Tetsuya Shinjo | 2014-12-23 |
| 8481247 | Resist underlayer film forming composition containing liquid additive | Yusuke Horiguchi, Tetsuya Shinjo | 2013-07-09 |
| 8426111 | Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating | Tetsuya Shinjo, Motohiko Hidaka | 2013-04-23 |
| 8283103 | Composition for forming resist underlayer film for lithography and production method of semiconductor device | Hikaru Imamura, Yasushi Sakaida, Makoto Nakajima | 2012-10-09 |
| 8227172 | Method of producing semiconductor device using resist underlayer film by photo-crosslinking curing | Yusuke Horiguchi, Tetsuya Shinjo | 2012-07-24 |
| 8163460 | Underlayer coating forming composition for lithography containing polysilane compound | Keisuke Hashimoto, Makoto Nakajima | 2012-04-24 |
| 8088546 | Underlayer coating forming composition for lithography containing naphthalene ring having halogen atom | Takahiro Sakaguchi, Tomoyuki Enomoto | 2012-01-03 |
| 8048615 | Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating | Yusuke Horiguchi, Keisuke Hashimoto, Makoto Nakajima | 2011-11-01 |
| 8007979 | Acrylic polymer-containing gap fill material forming composition for lithography | Kazuhisa Ishii, Takahiro Kishioka, Yasushi Sakaida | 2011-08-30 |
| 7842620 | Method for manufacturing semiconductor device using quadruple-layer laminate | Makoto Nakajima, Yasushi Sakaida, Hikaru Imamura, Keisuke Hashimoto, Takahiro Kishioka | 2010-11-30 |
| 7727902 | Composition for forming nitride coating film for hard mask | Yasushi Sakaida | 2010-06-01 |
| 7687223 | Underlayer coating forming composition for lithography containing cyclodextrin compound | Tetsuya Shinjo, Keisuke Hashimoto | 2010-03-30 |
| 7517633 | Composition for forming gap-filling material for lithography | Ken-ichi Mizusawa, Yasuhisa Sone | 2009-04-14 |
| 7425347 | Composition for forming anti-reflective coating for use in lithography | Yoshiaki Yasumi, Ken-ichi Mizusawa | 2008-09-16 |
| 7365023 | Porous underlayer coating and underlayer coating forming composition for forming porous underlayer coating | Yasushi Sakaida | 2008-04-29 |
| 7361718 | Alkali-soluble gap fill material forming composition for lithography | Kazuhisa Ishii, Shinya Arase | 2008-04-22 |
| 7226721 | Underlayer coating forming composition for lithography containing compound having protected carboxyl group | Takahiro Kishioka, Yasushi Sakaida, Tetsuya Shinjo | 2007-06-05 |
| 6444320 | Thermosetting anti-reflective coatings for full-fill dual damascene process | Yasuhisa Sone, Ken-ichi Mizusawa | 2002-09-03 |
| 4780465 | Aqueous solution containing a quinolone carboxylic acid | Kazumi Ogata, Hideo Terayama | 1988-10-25 |