Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10113083 | Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound | Ryuta MIZUOCHI, Tokio NISHITA, Yasushi Sakaida, Rikimaru Sakamoto | 2018-10-30 |
| 9927705 | Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same | Noriaki Fujitani, Takafumi Endo, Rikimaru Sakamoto | 2018-03-27 |
| 9746768 | Resist overlayer film forming composition for lithography and method for producing semiconductor device using the same | Rikimaru Sakamoto, Noriaki Fujitani | 2017-08-29 |
| 9494864 | Resist overlayer film forming composition for lithography and method for manufacturing semiconductor device using the same | Rikimaru Sakamoto, Bangching Ho | 2016-11-15 |
| 9448480 | Resist underlayer film formation composition and method for forming resist pattern using the same | Tokio NISHITA, Noriaki Fujitani, Rikimaru Sakamoto | 2016-09-20 |
| 9240327 | Resist underlayer film-forming composition for EUV lithography containing condensation polymer | Rikimaru Sakamoto, Noriaki Fujitani, Takafumi Endo, Bangching Ho | 2016-01-19 |
| 9046768 | Resist overlayer film forming composition for lithography | Takafumi Endo, Rikimaru Sakamoto | 2015-06-02 |
| 8962234 | Resist underlayer film forming composition and method for forming resist pattern using the same | Takafumi Endo, Rikimaru Sakamoto | 2015-02-24 |
| 8722840 | Resist underlayer film forming composition, and method for forming resist pattern using the same | Rikimaru Sakamoto, Noriaki Fujitani, Takafumi Endo, Bangching Ho | 2014-05-13 |
| 5060281 | Method and apparatus for detecting disparity of cyclic length of printed patterns | — | 1991-10-22 |
| 4975971 | Method and apparatus for detecting significant difference of sheet material | — | 1990-12-04 |